Negative-type extreme ultraviolet resist materials based on water-wheel-like cyclic oligomer (Noria)

Japanese Journal of Applied Physics

Volumn 49, Issue 6 PART 2, 2010, Pages

  Seki, Hiroyuki ^a   Kato, Yuki ^a   Kudo, Hiroto ^a   Oizumi, Hiroaki ^b   Itani, Toshiro ^b   Nishikubo, Tadatomi ^a  

^a KANAGAWA UNIVERSITY   (Japan)

^b SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CYCLIC OLIGOMERS; EXTREME ULTRAVIOLET; EXTREME ULTRAVIOLETS; FILM-FORMING; OXETANYL; PHOTOCHEMICAL REACTIVITY; RESIST MATERIALS;

WHEELS;

PHOTOCHEMICAL FORMING;

EID: 77955332401     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.49.06GF06     Document Type: Article

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