JSR EUV resist development toward 22nmhp deslgn and beyond

Journal of Photopolymer Science and Technology

Volumn 23, Issue 5, 2010, Pages 643-648

  Kimura, Tooru ^a   Nishino, Kouta ^a   Shimizu, Makoto ^a   Hirai, Yuuki ^a   Maruyama, Ken ^a   Kai, Toshiyuki ^a  

^a JSR CORPORATION   (Japan)

Author keywords

Acid amplifier; EUV; Lithography; Molecular glass; PAG

Indexed keywords

EID: 77957135651     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.23.643     Document Type: Article

References (23)

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