Understanding the chemical vapor deposition of diamond: Recent progress

Journal of Physics Condensed Matter

Volumn 21, Issue 36, 2009, Pages

  Butler, J E ^a   Mankelevich, Y A ^b   Cheesman, A ^c   Ma, Jie ^c   Ashfold, M N R ^c  

^a NAVAL RESEARCH LABORATORY   (United States)

^b MOSCOW STATE UNIVERSITY   (Russian Federation)

^c UNIVERSITY OF BRISTOL   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL SPECIES; DIAMOND CVD; DIAMOND GROWTH; DIAMOND MATERIALS; EXPERIMENTAL MEASUREMENTS; GASPHASE; IN-SITU; MICROWAVE PLASMA; PLASMA KINETIC; RECENT PROGRESS; SURFACE CHEMICALS;

COUPLED CIRCUITS; DIAMOND FILMS; DIAMONDS; GROWTH KINETICS; MICROWAVES; PLASMA DEPOSITION; PLASMAS; VAPORS;

CHEMICAL VAPOR DEPOSITION;

EID: 70349597405     PISSN: 09538984     EISSN: 1361648X     Source Type: Journal    
DOI: 10.1088/0953-8984/21/36/364201     Document Type: Article

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