Modeling of H2 and H2/CH4 moderate-pressure microwave plasma used for diamond deposition

Plasma Chemistry and Plasma Processing

Volumn 18, Issue 3, 1998, Pages 325-362

  Hassouni, K ^a   Leroy, O ^b   Farhat, S ^a   Gicquel, A ^a  

^a UNIVERSITÉ PARIS 13   (France)

^b NONE

Author keywords

Diamond deposition; Microwave plasma; Modeling

Indexed keywords

EID: 0032386403     PISSN: 02724324     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1021845402202     Document Type: Article

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