Nanocrystalline diamondfilms1

Annual Review of Materials Science

Volumn 29, Issue , 1999, Pages 211-259

  Gnien, Dieter M ^a  

^a ARGONNE NATIONAL LABORATORY   (United States)

Author keywords

Carbon dimer; Grain boundaries; Noble gas; Nucleation rate; Plasmas

Indexed keywords

CARBON; CHEMICAL VAPOR DEPOSITION; CRYSTAL MICROSTRUCTURE; DIAMOND FILMS; ELECTRIC PROPERTIES; FILM GROWTH; GRAIN BOUNDARIES; HYDROGEN BONDS; NUCLEATION; OPTICAL PROPERTIES; PHASE TRANSITIONS; SYNTHESIS (CHEMICAL);

CARBON DIMER; CARBON HYDROGEN BONDS; CARBON-CARBON BONDS; CRYSTALLITES; GAS MIXTURE;

NANOSTRUCTURED MATERIALS;

EID: 6744263823     PISSN: 00846600     EISSN: None     Source Type: Journal    
DOI: 10.1146/annurev.matsci.29.1.211     Document Type: Article

References (128)

1. Celii FG, Butler JE. 1991. Anna. Rev. Phys. Chem. 42:643
2. Angus JC, Hayman CC. 1988. Science 241:913
3. Spear KE, Dismukes JP, eds. 1994. Synthetic Diamond. New York: Wiley
4. Wild C, Koidl P, Muller-Sebert W, Walcher H, Kohl R, et al. 1993. Diamond Rel Mater. 2:158
5. Matsumoto O, Toshima H, Kamazaki Y. 1985. Thin Solid Films 128:341
6. Matsumoto O, Katagiri T. 1987. Thin Solid Films 146:283
7. Zhu W, Inspektor A, Badzian AR, McKenna T, Messier R. 1990. / Appl. Phys. 68:1489
8. Balestrina G, Marinelli M, Milan! E, Paoletti A, Paroli P, et al. 1993. Diamond Rel. Mater. 2:389
9. Shih HC, Sung CP, Hsu WT, Sung SL, Hwang CT, et al. 1993. Diamond Rel. Mater. 2:531
10. 9a. Mitsuda Y, Kojima Y, Yoshida T, Akashi I. 1987. J. Mater. Sei. 22:1557
11. Reisler H, Mangir MS, Vittig C. 1980. J. Chem. Phys. 73:2280
12. HomerDA.CurtissLA.GruenDM. 1995. Chem. Phys. Lett. 233:243
13. Krätschmer W, Lamb LD, Fostiorpoulas K, Huffman DR. 1990. Nature 347:354
14. O'Brien SC, Heath JR, Curl RF, Smalley RE. 1988. J. Chem. Phys. 88:220
15. Gruen DM. 1993. Nucl. Instr. Methods Phys. Res. B 78:118
16. GruenDM,LiuS,KraussAR,LuoJ,Pan X. 1994. Appl Phys. Lett. 64:1502
17. Gruen DM, Liu S, Krauss AR, Pan X. 1994.7. Appl. Phys. 75:1758 16a.
18. Gruen DM, Zuiker CD, Krauss AR. 1995. In Fullerenes and Photonics II, ed. ZH Kafafi, 2530:1-13. Bellingham, WA: SPIE
19. Busmann HG, Brauneck U, David H-W. 1998. Carbon 36:529
20. SinghJ. 1994. J. Mater. Sei. 29:2761
21. lijima S, Aikawa Y, Baba K. 1991. J. Mater. Res. 6:1491
22. Avalos-Borja M, Hiraata GA, Contreras O, Ning XG, Duarte-Moller A, Barna A. 1996. Diamond Rel. Mater. 5:1249
23. Nistor LC, Van LanduytJ, Ralchenko VG, Obraztsova ED, Smolin AA. 1997. Diamond Rel. Mater. 6:159
24. Luo JS, Gruen DM, Krauss AR, Pan XZ, Liu SZ. 1995. In Recent Advances in the Chemistry and Physics ofFullerenes and Rel. Materials, éd. RS Ruoff, KM Kadish, pp. 43-50. Bellingham, WA: SPIE
25. Csencsits R, Zuiker C, Gruen DM, Krauss AR. 1996. Solid State Phenom. 261:51
26. Qin LC, Zhou D, Krauss AR, Gruen DM. 99S.NanoslrucluredMater. 10:4
27. Qin LC, Hobbs LV. 1995. Mater. Res. Soc. Symp. Proc. 373:341
28. Fink J, Muller-Heinzerling T, Pflueger J, Bubenzer A, KoidI K, Creclius G. 1983. Solid State Commun. 47:687
29. Deleted in proof
30. Keblinski P, Wolf D, Phillpot SR, Gleiter H. 1998.7. Mater. Res. 13:2077
31. Stöhr J. 1992. NEXAFS. New York: Springer
32. Chaiken A, Terminello LJ, Wong J, Doll GL, Taylor ÇA II. 1993. Appl. Phys. Lett. 63:2112
33. 30a. Terminello LJ, Chaiken A, Wong J, Doll GL, Taylor ÇA II. 1994.7. Vac Sei. Technol.A 12:2462
34. Yang X-Q, Ruckmann MW, Skotheim TA, den Boer M, Zheng Y, et al. 1990. J. Vac. Sei. Technol. A 9:1140
35. 3la. Wang Y, Chen H, Hoffman RW. 1990. J. Vac. Sei. Technol. A 9:1154
36. 31b. Nithianandam J, Rife JC. 1992. Appl. Phys. Lett. 60:135
37. Capehart TW, Perry TA, Beetz CB, Belton DN, Fisher GB, et al. 1989. Appl. Phys. Lett. 55:957
38. Gruen DM, Krauss AR, Zuiker CD, Csencisits R, Terminello LJ, et al. 1996. Appl. Phys. Lett. 68:1640
39. Morar JF, Himpsel FJ, Hollinger G, Hughes G, Jordan JL. 1985. Phys. Rev. Lett. 54:1960
40. Batson PE. 1993. Phys. Rev. B 48:2608
41. van der Drift A. 1967. Philips Res. Rep. 22:267
42. Erz R, Dotter W, Jung D, Ehrhardt H. 1993. Diamond Rel. Mater. 2:449
43. Nistor LC, Van Landuyt J, Ralchenko VG, Obratzova ED, Korotushenko KG, Smolin AA. 1997. Mater. Sei. Forum 239241:115
44. Smolin AA, Ralchenko VG, Pimenov SM, Obraztsova ED, et al. 1995. Diamond Rel. Mater. 4:1073
45. Obraztsova ED, Pimenov SM, Ralchenko VG, Smolin AA, et al. 1995. SPIE 2428:612
46. Khomich AV, Polyakov VI, Perov PI, Varnin VP, Teremetskaya IG, et al. 1996. Mater. Res. Soc. Symp. Proc. 423:723
47. Fedoseev DV, Bukhovets VL, Varshavskaya IG, Tolmachev YN. 1996. RUSS. J. Phys. Chem. 70:1594
48. Lee J, Hong B, Messier R, Collins RW. 1996. Appl. Phys. Lett. 69(12):1716
49. Kundu SN, Basu M, Maity AB, Chaudhuri S, Pal AK. 1997. Mater. Lett. 31: 303
50. Zarrabian M, Fourches-Coulon N, Turban G,MarhicC,LancinM. 1997. Appl. Phys. Lett. 70(19):2535
51. Amaratunga G, Putnis A, Clay K, Milne W. 1989. Appl. Phys. Lett. 55:634
52. Amaratunga GAJ, Suva SRP, McKenzie DA. 1991. J. Appl Phys. 70:5374
53. BhusariDM,YangJR,WangTY,LinST, Chen KH, Chen LC. 1998. Solid State Commun. 107(6):301
54. Zhou D, McCauley TG, Qin LC, Krauss AR, Gruen DM. 1998. J. Appl. Phys. 83:540
55. Shih HC, Sung CP, Fan WL, Hsu WL. 1993. Thin Solid Films 232:41
56. Joeris P, Benndorf C, Bohr S. 1992. / Appl. Phys. 71:4638
57. Wagner J, Wild C, Koidl P. 1991. Appl. Phys. Lett. 59:779
58. Zhou D, Gruen DM, Qin LC, McCauley TG, Krauss AR. 1998. J. Appl. Phys. 84:1981
59. Zuiker CD, Krauss AR, Gruen DM, Carlisle JA, Terminello LJ, et al. 1996. In Applications of Synchrotron Radiation Techniques to Materials Sciences III, ed. LJ Terminello, SM Mini, H Ade, DL Perry, 432:211. Pittsburgh: Mater. Res. Soc.
60. Nemanich RJ, Glass JT, Lucovsky G, Shroder RE. 1988. J. Vac Sei. Technol. A 6:1783
61. Goyette AN, Lawler JE, Andersen LV, Gruen DM, McCauley TG, et al. 1998. Plasma Sources Sei. Technol. 7: 149
62. Goyette AN, Lawler JE, Anderson LAV, Gruen DM, McCauley TG, et al. 1998. J. Phys. D. 31:1975
63. Goyette AN, Lawler JE, Anderson LW, Gruen DM, McCauley TG, et al. 1998. Mater. Res. Soc. Symp. Proc. 508:275
64. Bower MT, Laudenslager JB. 1976. In Principles of Laser Plasmas, ed. G Bekefi. New York: Wiley
65. Tsuji M, Kouno H, Matsumua K, Funatsu T, Nishimura Y. 1993. J. Chem. Phys. 98:2011
66. Mul PM, McGowan JW. 98Q.Astrophys. J. 237:749
67. JavaheryG, Pétrie S, Wang J.BohmeDK. 1992. Chem. Phys. Lett. 195:7
68. Mason NJ, Newell VR. 1987. J. Phys. B 20:1357
69. Rapp D, Englander-Golden P. 1965. J. Chem. Phys. 43:1464
70. PhelpsAV. 992.J.Phys. Chem.Ref.Dala 21:883
71. Fehsenfeld FC, Schrneltekopf AL, Ferguson EE. 1967. J. Chem. Phys. 46:2802
72. Guogousi T, Johnsen R, Golde MF. 1995. Int. J. Mass. Spectrosc. Ion Processes 149: 131
73. Hirshfelder JO, Curtiss CF, Bird RB. 1954. Molecular Theory of Gases and Liquids. New York: Wiley
74. Bonin KD, Kadar-Kallen MA. 1994. Int. J. Mod. Phys. 8:3313
75. Redfem PC, Horner DA, Curtiss LA, Gruen DM. 1996. J. Phys. Chem. 100: 11654
76. Huang D, Frenklach M. 1992. J. Phys. Chem. 96:1868
77. 71a. SkokovS, Weiner B, Frenklach M. 1994. J. Phys. Chem. 94:7073
78. 71b. Skokov S, Weiner B, Frenklach M. 1995. J. Phys. Chem. 99:5616
79. 71c. Frenklach M. 1989. J. Appl. Phys. 65: 5142
80. 71d. Frenklach M, Wang H. 1991. Phys. Rev. B. 43:1520
81. 71e. Frenklach M. 1992. J. Chem. Phys. 97: 5794
82. Garrison B J, Dawnkaski EJ, Srivastava D, Brenner D. 1992. Science 255:835
83. Belton DN, Harris SJ. 1992. / Chem. Phys. 96:2371
84. 73a. Harris SJ, Belton DN, Blint RJ. 1991. J. Appl Phys. 70:2654
85. 73b. Harris SJ, Belton DN. 1991. Jpn. J. Appl. Phys. 30:2615
86. 73c. Harris SJ, Goodwin DG. 1993. J. Phys. Chem. 97:23
87. Latham CD, Heggie MI, Jones R. 1993. Diamond Rel Mater. 2:1493
88. Gruen DM, Qin LC. 1996. Mater. Res. Soc. Mtg. p. 20 (Abstr. A.6.1)
89. Hehre WJ, Radom L, Pople JA. 1997. Ab Initia Molecular Orbital Theory. New York: Wiley
90. Frisch MJ, Trucks GW, Schlegel HB, Gill PMW, Johnson BG, et.al. 1995. Gaussian 94. Pittsburgh: Gaussian
91. Kohn W, Becke AD, Parr RG. 1996. J. Phys. Chem. 100:12874
92. Gruen DM, Curtiss LA, Redfern PC, Qin LC. 1998. In Fullerenes: Recent Advances in the Chemistry and Physics of Fullerenes and Related Materials, ed. KM Kadish, RS Ruoff, 98-8:509. Pennington, NJ: Electrochem. Soc.
93. Keblinski P, Wolf D, Cleri F, Phillpot SR, Gleiter H. 1998. MRS Bull. 23(9):36
94. Tersoff J. 1988. Phys. Rev. Lett. 61:2879
95. Tersoff J. 1988. Phys. Rev. B 38:9902
96. Csencsits R, Gruen DM, Krauss AR, Zuiker C. 1996. In Polycrystalline Tliin Films: Structure Texture, Properties and Applications II, ed. HJ Frost, MA Parker, ÇA Ross, EA Holm, 4403:291. Pittsburgh: Mater. Res. Soc.
97. Keblinski P, Phillpot SR, Wolf D, Gleiter H. 1997. Acta Mater. 45:987
98. Hayward IP. 1991. Surf. Coat. Technol. 49:554
99. Gardos MN, Ravi KV. 1994. Diamond Films Technol. 4:139
100. Miyoshi K, Wu RLC, Arscadden A, Barnes N, Jackson L. 1993. / Appl. Phys. 74:4446
101. Chandrasekar S, Bhushan B. 1992. Wear 153:79
102. Miyoshi K, Wu RLC, Garscadden A. 1992. Surf. Coat. Technol. 54/55:428
103. Dugger MT, Peebles DE, Pope LE. 1992. In Surface Science Investigations in Tribology, Experimental Approaches, ed. YW Chung, AM Homolo, GB Street, 485: 72. Washington DC: Am. Chem. Soc.
104. Erdemir A, Bindal C, Fenske GR, Wilbur P. 1996. Tribal Trans. 39:735
105. Kohzaki M, Higuchi K, Noda S, Uchida K. 1992.7. Mater. Res. 7:1769
106. Erdemir A, Bindal C, Pagan J, Wilbur P. 1995. Surf. Coat. Technol. 76/77:559
107. Liu Y, Erdemir A, Meletis EI. 1996. Surf. Coat. Technol. 82:48
108. Bowden FP, Tabor D. 1994. Friction and Lubrication of Solids, Parti. Oxford, UK: Clarendon
109. Hayward IP, Singer IL, Seitzman LE. 1992. Wear 157:215
110. Pepper SV. 1982. J. Vac. Sei. Technol. 20: 643
111. Pepper SV. 1982.7. Vac. Sei. Technol. 10: 213
112. Bowden FP, Young JE. 95l.Proc.R.Soc. London Ser. A 208:444
113. Bowden FP, Harwell AE. 1966. Proc. R. Soc. London Ser. A 295:233
114. Erdemir A, B indal C, Fenske GR, Zuiker C, Krauss A, Gruen D. 1996. Diamond Rel. Mater. 5:923
115. Zuiker C, Krauss AR, Gruen DM, Pan X, Lee JC, et al. 1995. Thin Solid Films 270:154
116. Erdemir A, Halter M, Fenske GR, Zuiker C, Csencsits R, et al. 1997. Tribal. Trans. 40:667
117. McCauley TG, Corrigan TD, Krauss AR, Auciello O, Zhou, et al. 1998. Mater. Res. Soc. Symp. Proc. 498:227
118. Krauss AR, Gruen DM, Zhou D, McCauley TG, Qin LC, et al. 1998. Mater. Res. Soc. Symp. Proc. 495:299
119. Robertson J. 1999. Phys. Rev. B. In press
120. Swain GM.Anderson AB, Angus J. 1998. MRS Bull 23(9):56
121. Gruen DM, Redfern PC, Homer DA, Curtiss LA. 1999. J. Phys. Chem. In press
122. Skokov S, Weiner B, Freaklach M. 1995. J. Phys. Chem. 99:5616
123. Badzian AR, deVries RD. 1988. MRS Bull. 23:385
124. Gruen DM, Krauss AR, Zhou D, McCauley TG, Corrigan TD, et al. 1997. In Chemical Vapor Deposition, ed. MD Allendorf, C Bernard, 97-25:325-32. Pennington, NJ: Electrochem. Soc.
125. Erdemir A, Halter M, Fenske GR, Krauss A, Gruen DM, et al. 1997. Surf. Coat. Technol. 94/95:537
126. Hogmark S, Hollman P, Alahelisten A, HedenqvistP. 1996. Wear 200:225
127. Hollman P, Wänstrand O, Hogmark S. 1998. Diamond Rel. Mater. 7:1471
128. Rotter S. 1998. Isr. J. Chem. 38:135