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Journal of Crystal Growth

Volumn 194, Issue 3-4, 1998, Pages 353-368

Atomic-scale simulations of chemical vapor deposition on flat and vicinal diamond substrates

(3) Battaile, C C a Srolovitz, D J a Butler, J E b

a UNIVERSITY OF MICHIGAN (United States)

b NAVAL RESEARCH LABORATORY (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; FILM GROWTH; MONTE CARLO METHODS; REACTION KINETICS; SEMICONDUCTING DIAMONDS; SUBSTRATES;

DIAMOND GROWTH; DIAMOND SUBSTRATES;

THIN FILMS;

EID: 0032297057 PISSN: 00220248 EISSN: None Source Type: Journal
DOI: 10.1016/S0022-0248(98)00685-X Document Type: Article

Times cited : (46)

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