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Volumn 291, Issue 2, 2006, Pages 533-539

Multiple growth and characterization of thick diamond single crystals using chemical vapour deposition working in pulsed mode

Author keywords

A1. Optical characterization; A3. Chemical vapour deposition; A3. Homoepitaxy; B1. Diamond; B1. Nitrogen

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTAL GROWTH; DIAMONDS; NITROGEN; RAMAN SPECTROSCOPY; THERMAL EFFECTS;

EID: 33747076395     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2006.03.046     Document Type: Article
Times cited : (28)

References (28)
  • 9
    • 33747072888 scopus 로고    scopus 로고
    • A. Gicquel, F. Silva, X. Duten, K. Hassouni, G. Lombardi, A. Rousseau, Croissance de films de diamant par plasma pulsé, Patent No. FR0300254, 2003.
  • 21
    • 33747066883 scopus 로고    scopus 로고
    • A. Tallaire, A.T. Collins, D. Charles, M. Newton, J. Achard, R.S. Sussmann, A. Gicquel, Diam. Relat. Mater. (2006, accepted for publication).


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.