Growth and characterization of near-atomically flat, thick homoepitaxial CVD diamond films

Physica Status Solidi (A) Applications and Materials Science

Volumn 202, Issue 11, 2005, Pages 2066-2072

  Bogdan, G ^a   Nesladek M ^a,b,c   Haen, J D ^b   Maes, J ^d   Moshchalkov, V V ^d   Haenen, K ^a,b   D'Olieslaeger, M ^a,b  

^a HASSELT UNIVERSITY   (Belgium)

^b IMEC   (Belgium)

^c DIF   (France)

^d KU LEUVEN   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

ASTEX MW PE CVD REACTOR; FLAT FILMS; HILLOCKS; HOMOEPITAXIAL;

CHEMICAL VAPOR DEPOSITION; ELECTRIC REACTORS; ETCHING; METHANE; OPTICAL MICROSCOPY; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SYNTHETIC DIAMONDS; THICK FILMS;

DIAMOND FILMS;

EID: 33745513403     PISSN: 18626300     EISSN: 18626319     Source Type: Journal    
DOI: 10.1002/pssa.200561930     Document Type: Conference Paper

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