Simplified description of microwave plasma discharge for chemical vapor deposition of diamond

Journal of Applied Physics

Volumn 101, Issue 6, 2007, Pages

  Yamada, Hideaki ^a   Chayahara, Akiyoshi ^a   Mokuno, Yoshiaki ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; DIAMONDS; DIFFERENTIAL EQUATIONS; MATHEMATICAL MODELS; MAXWELL EQUATIONS;

COMPUTATIONAL COSTS; MICROWAVE PLASMA DISCHARGE; NUMBER DENSITY; VACUUM FIELD ANALYSIS;

PLASMAS;

EID: 34047095310     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2711811     Document Type: Article

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