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Volumn 34, Issue 1, 1999, Pages 7-20

Atomistic simulation of chemical vapor deposition of (111)-oriented diamond film using a kinetic Monte Carlo method

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; CRYSTAL ATOMIC STRUCTURE; CRYSTAL ORIENTATION; FILM GROWTH; METHANE; MONTE CARLO METHODS; MORPHOLOGY; POINT DEFECTS; REACTION KINETICS; SURFACE ROUGHNESS; THERMAL EFFECTS;

EID: 0032665067     PISSN: 00222461     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1004488818266     Document Type: Article
Times cited : (48)

References (27)
  • 23
    • 0003687245 scopus 로고    scopus 로고
    • Sandia National Laboratories, San Diego, CA
    • SURFACE CHEMKIN III User Manual, Sandia National Laboratories, San Diego, CA, 1996.
    • (1996) Surface Chemkin III User Manual


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.