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Volumn 34, Issue 1, 1999, Pages 7-20
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Atomistic simulation of chemical vapor deposition of (111)-oriented diamond film using a kinetic Monte Carlo method
a a
a
AMRL
(United States)
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Author keywords
[No Author keywords available]
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Indexed keywords
CHEMICAL VAPOR DEPOSITION;
COMPUTER SIMULATION;
CRYSTAL ATOMIC STRUCTURE;
CRYSTAL ORIENTATION;
FILM GROWTH;
METHANE;
MONTE CARLO METHODS;
MORPHOLOGY;
POINT DEFECTS;
REACTION KINETICS;
SURFACE ROUGHNESS;
THERMAL EFFECTS;
ATOMISTIC SIMULATION;
DIAMOND FILMS;
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EID: 0032665067
PISSN: 00222461
EISSN: None
Source Type: Journal
DOI: 10.1023/A:1004488818266 Document Type: Article |
Times cited : (48)
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References (27)
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