A computational model for the hot-filament chemical vapour deposition process to produce diamond films

Modelling and Simulation in Materials Science and Engineering

Volumn 15, Issue 3, 2007, Pages 237-261

  Olivas Martinez M ^a   Perez Tello M ^a   Cabanillas Lopez R ^a   Contreras Lopez O ^b   Soto Herrera, G ^b   Castillon Barraza F ^b  

^a UNIVERSIDAD DE SONORA   (Mexico)

^b UNIVERSIDAD NACIONAL AUTÓNOMA DE MÉXICO   (Mexico)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTORS; COMPUTATIONAL FLUID DYNAMICS; CONCENTRATION (PROCESS); DIAMOND FILMS; MATHEMATICAL MODELS; NUMERICAL METHODS;

COMPUTATIONAL MODELS; GAS PHASE TRANSPORT EQUATIONS; HFCVD REACTORS; REACTION CHAMBERS;

CHEMICAL VAPOR DEPOSITION;

EID: 34147191972     PISSN: 09650393     EISSN: 1361651X     Source Type: Journal    
DOI: 10.1088/0965-0393/15/3/004     Document Type: Article

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