Probing the plasma chemistry in a microwave reactor used for diamond chemical vapor deposition by cavity ring down spectroscopy

Journal of Applied Physics

Volumn 104, Issue 10, 2008, Pages

  Ma, Jie ^a   Richley, James C ^a   Ashfold, Michael N R ^a   Mankelevich, Yuri A ^b  

^a UNIVERSITY OF BRISTOL   (United Kingdom)

^b MOSCOW STATE UNIVERSITY   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC PHYSICS; ATOMIC SPECTROSCOPY; ATOMS; CHEMISTRY; DIAMONDS; FORECASTING; FUNCTIONAL GROUPS; HYDROCARBONS; LOW PRESSURE CHEMICAL VAPOR DEPOSITION; MICROWAVES; MIXTURES; PLASMA DEPOSITION; PLASMAS; SINGLE CRYSTALS; SUBSTRATES; TELLURIUM COMPOUNDS; TWO DIMENSIONAL; VAPORS;

CAVITY RING DOWN SPECTROSCOPIES; CH RADICALS; COLUMN DENSITIES; DIAMOND CHEMICAL VAPOR DEPOSITIONS; DIAMOND SURFACES; ELECTRON DENSITIES; GROWTH SPECIES; HOT PLASMAS; MICROWAVE REACTORS; NUMBER DENSITIES; PLASMA CHEMISTRIES; PROCESS CONDITIONS; PROCESS GASSES; RADICAL SPECIES; SINGLE CRYSTAL DIAMONDS; SUBSTRATE SURFACES;

GAS MIXTURES;

EID: 57049128739     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3021095     Document Type: Article

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