Modeling of microwave discharges of H 2 admixed with C H 4 for diamond deposition

Journal of Applied Physics

Volumn 98, Issue 5, 2005, Pages

  Lombardi, G ^a   Hassouni, K ^a   Stancu, G D ^b   Mechold, L ^c   Ropcke J ^b   Gicquel, A ^a  

^a UNIVERSITÉ PARIS 13   (France)

^b INP GREIFSWALD   (Germany)

^c Laser Components GmbH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ENERGY DISTRIBUTION; HIGH-POWER DENSITY; HIGH-QUALITY DIAMOND FILMS; MICROWAVE DISCHARGES;

DEPOSITION; DIAMOND FILMS; ELECTRONS; INFRARED RADIATION; MICROWAVES; SEMICONDUCTOR LASERS; SPECTROSCOPIC ANALYSIS;

HYDROGEN;

EID: 25144509402     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2034646     Document Type: Article

References (62)

1. S. J. Harris, Appl. Phys. Lett. 56, 2298 (1990).
2. D. G. Goodwin, Appl. Phys. Lett. 59, 277 (1991).
3. K. Hassouni, O. Leroy, S. Farhat, and A. Gicquel, Plasma Chem. Plasma Process. 18, 325 (1998).
4. A. Gicquel, K. Hassouni, S. Farhat, Y. Breton, C. D. Scott, and M. Lefebvre, Diamond Relat. Mater. 3, 581 (1994).
5. A. Gicquel, M. Chenevier, Y. Breton, M. Petiau, J. P. Booth, and K. Hassouni, J. Phys. III 6, 1167 (1996).
6. A. Gicquel, K. Hassouni, Y. Breton, M. Chenevier, and J. C. Cubertafon, Diamond Relat. Mater. 5, 336 (1996).
7. A. Gicquel, M. Chenevier, K. Hassouni, A. Tserepi, and M. Dubus, J. Appl. Phys. 83, 7504 (1998).
8. M. A. Cappelli, T. G. Owano, A. Gicquel, and X. Duten, Plasma Chem. Plasma Process. 20, 15 (2000).
9. G. Lombardi, G. D. Stancu, F. Hempel, A. Gicquel, and J. Röpcke, Plasma Sources Sci. Technol. 13, 27 (2004).
10. G. Lombardi, K. Hassouni, G. D. Stancu, L. Mechold, J. Röpcke, and A. Gicquel, Plasma Sources Sci. Technol. 14, 440 (2005).
11. C. G. Schwärzler, O. Schnabl, J. Laimer, and H. Störi, Plasma Chem. Plasma Process. 16, 173 (1996).
12. W. L. Hsu, J. Appl. Phys. 72, 3102 (1992).
13. M. C. McMaster, W. L. Hsu, M. E. Coltrin, D. S. Dandy, and C. Fox, Diamond Relat. Mater. 4, 1000 (1995).
14. T. Lang, J. Laimer, and H. Störi, Diamond Relat. Mater. 3, 470 (1994).
15. R. S. Tsang, P. W. May, and M. N. R. Ashfold, Diamond Relat. Mater. 8, 242 (1999).
16. J. M. Petherbridge, P. W. May, and M. N. R. Ashfold, J. Appl. Phys. 89, 5219 (2001).
17. C. R. Koemtzopoulos, D. J. Economou, and R. Pollard, Diamond Relat. Mater. 2, 25 (1993).
18. M. J. Wouters, Plasma Sources Sci. Technol. 4, 482 (1995).
19. C.-K. Chen, T.-C. Wei, L. R. Collins and J. Phillips, J. Phys. D 32, 688 (1999).
20. K. Hassouni, S. Farhat, C. D. Scott, and A. Gicquel, J. Phys. III 6, 1229 (1996).
21. K. Hassouni, C. D. Scott, and S. Farhat, in Handbook of Industrial Diamonds and Diamonds Films, edited by, M. A. Prelas, G. Popovici, and, L. K. Bigelow, (Marcell Dekker, New York, 1997), p. 653.
22. K. Hassouni, C. D. Scott, S. Farhat, A. Gicquel, and M. Capitelli, Surf. Coat. Technol. 97, 391 (1997).
23. K. Hassouni, T. A. Grotjohn, and A. Gicquel, J. Appl. Phys. 86, 134 (1999).
24. C. D. Scott, S. Farhat, A. Gicquel, K. Hassouni, and M. Lefebvre, J. Thermophys. Heat Transfer 10, 426 (1996).
25. K. Hassouni, A. Gicquel, M. Capitelli, and J. Loureiro, Plasma Sources Sci. Technol. 8, 495 (1999).
26. H. Tawara, Y. Itakawa, H. Nishimura, H. Tanaka, and Y. Nakamura, NIFS-DATA Res. Rep. 6, 1990 (unpublished).
27. O. Sueoka and S. Mori, J. Phys. B 22, 963 (1989).
28. A. Jain, J. Phys. B 26, 4833 (1993).
29. M. A. Khakoo, T. Jayaweera, S. Wang, and S. Trajmar, J. Phys. B 26, 4845 (1993).
30. K. H. Kochem, W. Sohn, K. Jung, H. Ehrhardt, and E. S. Chang, J. Phys. B 18, 1253 (1985).
31. J. O. Hirschfelder, C. F. Curtis, and R. B. Bird, The Molecular Theory of Gases and Liquids (Wiley, New York, 1967).
32. R. B. Bird, W. E. Stewart, and E. N. Lightfoot, Transport Phenomena (Wiley, New York, 2002).
33. J. M. Yos, Avco Corp., Research and Advance Development Division, RAD-TM-63-7, 1963 (unpublished).
34. J. H. Lee, AIAA Paper No. 84-1729, 1984 (unpublished).
35. Sandia National Laboratory: http:www.sandia.gov
36. R. J. Kee, G. D. Lewis, J. Warnatz, M. E. Coltrin, and J. A. Miller, Sandia National Laboratories Report, SAND86-8246, 1986 (unpublished).
37. J. Bittner, K. Kohse-Höinghaus, and U. Meier, Chem. Phys. Lett. 143, 571 (1988).
38. B. L. Preppernau, K. Pearce, A. Tserepi, E. Wurzberg, and T. A. Miller, Chem. Phys. 196, 371 (1995).
39. M. Capitelli, R. Celiberto, F. Esposito, A. Laricchiuta, K. Hassouni, and S. Longo, Plasma Sources Sci. Technol. 11, A7 (2002).
40. M. Heintze and M. Magureanu, J. Appl. Phys. 92, 2276 (2002).
41. B. W. Yu and S. L. Girshick, J. Appl. Phys. 75, 3914 (1994).
42. G. P. Smith, GRI-MECH 3.0; http:www.me.berkeley.edugri_mech
43. K. Tachibana, M. Nishida, H. Harima, and Y. Urano, J. Phys. D 17, 1727 (1984).
44. H. Tahara, K. Minami, A. Murai, T. Yasui, and T. Yoshikawa, Jpn. J. Appl. Phys., Part 1 34, 1972 (1995).
45. H. Tawara, Y. Itikawa, H. Nishimura, and M. Yoshino, J. Phys. Chem. Ref. Data 19, 617 (1990).
46. L. Lehfaoui, C. Rebion-Rowe, S. Laub́, J. B. A. Mitchell, and B. R. Rowe, J. Chem. Phys. 106, 1 (1997).
47. G. Lombardi, Ph.D. thesis, Universit́ Paris XI, 2003.
48. L. N. Krasnoperov, I. J. Kalinovski, H. N. Chu, and D. Gutmann, J. Phys. Chem. 97, 11787 (1993).
49. S. J. Harris and A. M. Weiner, J. Appl. Phys. 74, 1022 (1993).
50. Y. C. Kim and M. Boudart, Langmuir 7, 2999 (1991).
51. C. Hopf, K. Letourneur, W. Jacob, T. Schwarz-Selinger, and A. von Keudell, Appl. Phys. Lett. 74, 3800 (1999).
52. A. von Keudell, C. Hopf, T. Schwarz-Sellinger, and W. Jacob, Nucl. Fusion 39, 1451 (1999).
53. C. Hopf, T. Schwarz-Selinger, W. Jacob, and A. von Keudell, J. Appl. Phys. 87, 2719 (2000).
54. M. Meier and A. von Keudell, J. Chem. Phys. 116, 5125 (2002).
55. K. Radhakrishan and A. C. Hindmarsh, NASA, UCRL-ID-113855, 1993 (unpublished).
56. A. Gicquel, F. Silva, and K. Hassouni, J. Electrochem. Soc. 147, 2218 (2000).
57. T. A. Grotjohn, J. Asmussen, J. Sivagnaname, D. Story, A. L. Vikharev, A. M. Gorbachev, and A. Kolysko, Diamond Relat. Mater. 9, 322 (2000).
58. J. Röpcke, L. Mechold, X. Duten, and A. Rousseau, J. Phys. D 34, 2336 (2001).
59. D. G. Goodwin, J. Appl. Phys. 74, 6895 (1993).
60. G. Lombardi, F. B́ńdic, F. Mohasseb, K. Hassouni, and A. Gicquel, Plasma Sources Sci. Technol. 13, 275 (2004).
61. G. Lombardi, K. Hassouni, F. B́ńdic, F. Mohasseb, J. Röpcke, and A. Gicquel, J. Appl. Phys. 96, 6739 (2004).
62. M. C. Mc Master, W. L. Hsu, M. E. Coltrin, D. S. Dandy and C. Fox, Diamond Relat. Mater. 4, 1000 (1995).