Plasma-chemical processes in microwave plasma-enhanced chemical vapor deposition reactors operating with C/H/Ar gas mixtures

Journal of Applied Physics

Volumn 104, Issue 11, 2008, Pages

  Mankelevich, Yuri A ^a   Ashfold, Michael N R ^b   Ma, Jie ^b  

^a MOSCOW STATE UNIVERSITY   (Russian Federation)

^b UNIVERSITY OF BRISTOL   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON NANOTUBES; CHEMICAL ACTIVATION; CHEMICAL ENGINEERING; DIAMOND FILMS; DIAMONDS; FILM GROWTH; GAS MIXTURES; INFRARED SPECTROSCOPY; LOW PRESSURE CHEMICAL VAPOR DEPOSITION; MICROWAVES; PLASMA DEPOSITION; PLASMAS; VAPORS;

CAVITY RING DOWN SPECTROSCOPIES; CHEMICAL PROCESSES; CHEMICAL TRANSFORMATIONS; CHEMICAL VAPOR DEPOSITION REACTORS; COLUMN DENSITIES; DEPOSITION PROCESSES; DIAMOND GROWTHS; DIMENSIONAL MODELS; EXPERIMENTAL DATUMS; GRAIN SIZES; HOT PLASMAS; INPUT POWERS; MICROWAVE PLASMAS; MODEL RESULTS; PROCESS CONDITIONS; QUANTUM CASCADES; RELATIVE CONCENTRATIONS; ROTATIONAL TEMPERATURES; SEMIANALYTICAL EXPRESSIONS;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 58149234710     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3035850     Document Type: Article

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