Comparison of MWPCVD diamond growth at low and high process gas pressures

Diamond and Related Materials

Volumn 15, Issue 4-8, 2006, Pages 542-547

  Sternschulte, H ^a   Bauer, T ^a   Schreck, M ^a   Stritzker, B ^a  

^a UNIVERSITY OF AUGSBURG   (Germany)

Author keywords

CVD deposition; Diamond growth and characterisation; High growth rate; In situ analysis

Indexed keywords

CONCENTRATION (PROCESS); INTERFEROMETRY; MASS SPECTROMETRY; MICROWAVE DEVICES; PLASMA APPLICATIONS; PRESSURE EFFECTS;

CVD DEPOSITION; DIAMOND GROWTH AND CHARACTERISATION; HIGH GROWTH RATE; IN-SITU ANALYSIS;

VAPOR DEPOSITION;

EID: 33745279139     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2006.01.010     Document Type: Article

References (12)

1. Spear K.E., and Frenklach M. Pure Appl. Chem. 66 (1994) 1773
2. Butler J.E., and Wood R.L. In: Lettingham A., and Steeds J.W. (Eds). Thin Film Diamond (1993), Chapman and Hall, London 15
3. Goodwin D.G. J. Appl. Phys. 74 (1993) 6888
4. Goodwin D.G., and Butler J.E. In: Prelas M.A., Popovici G., and Bigelow L.K. (Eds). Handbook of Industrial Diamonds and Diamond Films (1998), Marcel Dekker, New York 527
5. Wang Y., and Angus J.C. In: Dismukes J.P., and Ravi K.V. (Eds). Proc. 3rd Intl. Symp. Diamond Materials (1993), The Electrochemical Society, Pennington 249
6. Evans E.A., and Angus J.C. Diamond Relat. Mater. 5 (1996) 200
7. Yan C.S., Vohra Y.K., Mao H.K., and Hemley R.J. Proc. Natl. Acad. Sci. U. S. A. 99 (2002) 12523
8. Tallaire A., Achard J., Silva F., Sussmann R.S., and Gicquel A. Diamond Relat. Mater. 14 (2005) 249
9. Wild C. In: Dischler B., and Wild C. (Eds). Low Pressure Synthetic Diamond: Manufacturing and Applications (1998), Springer, Berlin 189
10. Adam W., et al., (RD42 Collaboration). Nucl. Instrum. Methods A 514 (2003) 79
11. Bauer T., Schreck M., Sternschulte H., and Stritzker B. Diamond Relat. Mater. 14 (2005) 266
12. Lang T., Stiegler J., von Kaenel Y., and Blank E. Diamond Relat. Mater. 5 (1996) 1171