Critical review of the current status of thickness measurements for ultrathin SiO 2 on Si Part V: Results of a CCQM pilot study

Surface and Interface Analysis

Volumn 36, Issue 9, 2004, Pages 1269-1303

  Seah, M P ^a   Spencer, S J ^a   Bensebaa, F ^b   Vickridge, I ^c   Danzebrink, H ^d   Krumrey, M ^d   Gross, T ^e   Oesterle, W ^e   Wendler, E ^f   Rheinlander B ^g   Azuma, Y ^h   Kojima, I ^h   Suzuki, N ⁱ   Suzuki, M ^j   Tanuma, S ^k   Moon, D W ^l   Lee, H J ^l   Cho, Hyun Mo ^l   Chen, H Y ^m   Wee, A T S ⁿ   Osipowicz, T ⁿ   Pan, J S ^o   Jordaan, W A ^p   Hauert, R ^q   Klotz, U ^q   Van Der Marel, C ^r   Verheijen, M ^r   Tamminga, Y ^r   Jeynes, C ^s   Bailey, P ^t   Biswas, S ^u   Falke, U ^v   Nguyen, N V ^w   Chandler Horowitz, D ^w   Ehrstein, J R ^w   Muller, D ^x,y   Dura, J A ^w   more..

^a NATIONAL PHYSICAL LABORATORY   (United Kingdom)

^b NATIONAL RESEARCH COUNCIL CANADA   (Canada)

^c SORBONNE UNIVERSITÉ   (France)

^d PHYSIKALISCH TECHNISCHE BUNDESANSTALT   (Germany)

^e BAM FEDERAL INSTITUTE FOR MATERIALS RESEARCH AND TESTING   (Germany)

^f FRIEDRICH SCHILLER UNIVERSITY JENA   (Germany)

^g UNIVERSITY OF LEIPZIG   (Germany)

^h NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

ⁱ UTSUNOMIYA UNIVERSITY   (Japan)

^j NTT Advanced Technology Corporation   (Japan)

^k NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^l Korea Research Institute of Standards and Science   (South Korea)

^m PSB Corporation   (Singapore)

ⁿ NATIONAL UNIVERSITY OF SINGAPORE   (Singapore)

^o INSTITUTE OF MATERIALS RESEARCH AND ENGINEERING   (Singapore)

^p CSIR National Metrology Laboratory   (South Africa)

^q SWISS FEDERAL LABORATORIES FOR MATERIALS SCIENCE AND TECHNOLOGY   (Switzerland)

^r PHILIPS RESEARCH LABORATORIES   (Netherlands)

^s UNIVERSITY OF SURREY   (United Kingdom)

^t DARESBURY LABORATORY   (United Kingdom)

^u BRUNEL UNIVERSITY   (United Kingdom)

^v SUPERSTEM LABORATORY   (United Kingdom)

^w NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^x Applied and Engineering Physics   (United States)

^y LUCENT TECHNOLOGIES   (United States)

more..

Author keywords

Calibration; Ellipsometry; Gate oxides; GIXRR; Interlaboratory study; MEIS; Neutron reflectometry; NRA; RBS; Silicon dioxide; SIMS; TEM; Thickness measurement; Traceability; XPS

Indexed keywords

GATE OXIDES; GIXRR; GRAZING INCIDENCE X-RAY REFLECTOMETRY (GIXRR); MEDIUM ENERGY ION SCATTERING SPECTROMETRY (MEIS); MEIS; NEUTRON REFLECTOMETRY; NRA; NUCLEAR REACTION ANALYSIS (NRA); RBS; TRACEABILITY;

ADSORPTION; AUGER ELECTRON SPECTROSCOPY; CRYSTAL ORIENTATION; ELLIPSOMETRY; REFLECTOMETERS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SECONDARY ION MASS SPECTROMETRY; SILICA; SILICON WAFERS; THICKNESS MEASUREMENT; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

ULTRATHIN FILMS;

EID: 4744371609     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/sia.1909     Document Type: Article

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