Ultrathin SiO2 on Si. I. Quantifying and removing carbonaceous contamination

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 21, Issue 2, 2003, Pages 345-352

  Seah, M P ^a   Spencer, S J ^a  

^a NATIONAL PHYSICAL LABORATORY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

CONTAMINATION; ORGANIC SOLVENTS; ULTRASONIC CLEANING; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBONACEOUS CONTAMINATION;

SILICON WAFERS;

EID: 0037348327     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1535173     Document Type: Article

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