Oxide thickness determination by XPS, AES, SIMS, RBS and TEM

Proceedings of the International Conference on Ion Implantation Technology

Volumn 1, Issue , 1999, Pages 79-82

  Shallenberger, J R ^a   Cole, D A ^a   Novak, S W ^a   Moore, R L ^a   Edgell, M J ^a   Smith, S P ^a   Hitzman, C J ^a   Kirchhoff, J F ^a   Principe, E ^a   Biswas, S ^a   Bleiler, R J ^a   Nieveen, W ^a   Jones, K ^a  

^a NONE

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS MATERIALS; AUGER ELECTRON SPECTROSCOPY; CRYSTALLINE MATERIALS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTING SILICON COMPOUNDS; SILICA; THICKNESS MEASUREMENT; TRANSMISSION ELECTRON MICROSCOPY; ULTRATHIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

ATOMIC MIXING EFFECTS;

SEMICONDUCTING FILMS;

EID: 0033339344     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (22)