Estimation of surface excitation correction factor for 200-5000 eV in Ni from absolute elastic scattering electron spectroscopy

Surface and Interface Analysis

Volumn 30, Issue 1, 2000, Pages 212-216

  Tanuma, S ^a   Ichimura, S ^b   Goto, K ^c  

^a Arc Corporation   (Japan)

^b ELECTROTECHNICAL LABORATORY   (Japan)

^c NAGOYA INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ALGORITHMS; COMPUTATIONAL METHODS; ELECTRON ENERGY LEVELS; ELECTRON SCATTERING; ELECTRON SPECTROSCOPY; MATHEMATICAL MODELS; MONTE CARLO METHODS; SURFACE STRUCTURE;

CHEN EQUATION; INELASTIC MEAN FREE PATH (IMFP); OSWALD EQUATION; PENN ALGORITHM; PLASMONS; SURFACE EXCITATION CORRECTION (SEC) FACTOR; SURFACE EXCITATION PARAMETERS (SEP);

NICKEL;

EID: 0034245124     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/1096-9918(200008)30:1<212::AID-SIA793>3.0.CO;2-N     Document Type: Article

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