Recent advances in XPS characterization of ultra-thin oxides

Proceedings of the International Conference on Ion Implantation Technology

Volumn 1, Issue , 1999, Pages 566-569

  Shallenberger, Jeffrey R ^a   Cole, David A ^a   Downey, Daniel F ^a   Falk, Scott ^a   Zhao, Zhiyong ^a  

^a Evans East   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

SILICA; ULTRATHIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

LOW ENERGY ION IMPLANTED WAFERS; ULTRA-THIN OXIDE FILMS;

ION IMPLANTATION;

EID: 0033356899     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (8)