SiO2 film thickness metrology by x-ray photoelectron spectroscopy

Applied Physics Letters

Volumn 71, Issue 19, 1997, Pages 2764-2766

  Lu, Z H ^a   McCaffrey, J P ^a   Brar, B ^b   Wilk, G D ^b   Wallace, R M ^b   Feldman, L C ^c,e   Tay, S P ^d,f  

^a NATIONAL RESEARCH COUNCIL CANADA   (Canada)

^b TEXAS INSTRUMENTS   (United States)

^c LUCENT TECHNOLOGIES   (United States)

^d NORTEL NETWORKS   (Canada)

^e VANDERBILT UNIVERSITY   (United States)

^f AG Associates Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 1242342609     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.120438     Document Type: Article

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