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Volumn 196, Issue 3-4, 2002, Pages 209-214

Stopping power of SiO2 for 0.2-3.0 MeV He ions

Author keywords

Monte Carlo simulation; Rutherford backscattering; Silicon dioxide; Stopping power

Indexed keywords

COMPUTER SIMULATION; HELIUM; MONTE CARLO METHODS; SILICON WAFERS;

EID: 0036850533     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(02)01282-X     Document Type: Article
Times cited : (15)

References (17)
  • 9
    • 0011450423 scopus 로고    scopus 로고
    • J.F. Ziegler, SRIM2000.40. Available from http://www.SRIM.org.
    • Ziegler, J.F.1
  • 10
    • 0011399988 scopus 로고    scopus 로고
    • Ph.D. Thesis, University of Bologna, Faculty of Engineering
    • R. Pinghini, Ph.D. Thesis, University of Bologna, Faculty of Engineering, 1998.
    • (1998)
    • Pinghini, R.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.