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Volumn 196, Issue 3-4, 2002, Pages 209-214
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Stopping power of SiO2 for 0.2-3.0 MeV He ions
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Author keywords
Monte Carlo simulation; Rutherford backscattering; Silicon dioxide; Stopping power
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Indexed keywords
COMPUTER SIMULATION;
HELIUM;
MONTE CARLO METHODS;
SILICON WAFERS;
STOPPING POWER;
THERMAL OXIDATION;
SILICA;
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EID: 0036850533
PISSN: 0168583X
EISSN: None
Source Type: Journal
DOI: 10.1016/S0168-583X(02)01282-X Document Type: Article |
Times cited : (15)
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References (17)
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