Ultrathin SiO2 on Si: III mapping the layer thickness efficiently by XPS

Surface and Interface Analysis

Volumn 33, Issue 12, 2002, Pages 960-963

  Seah, Martin P ^a   White, R ^b  

^a NATIONAL PHYSICAL LABORATORY   (United Kingdom)

^b Thermo VG Scientific   (United Kingdom)

Author keywords

Ellipsometry; Layer thickness; SiO2; Wafer homogeneity; XPS

Indexed keywords

ELLIPSOMETRY; SILICA; SILICON WAFERS; ULTRATHIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

LAYER THICKNESS;

SURFACE STRUCTURE;

EID: 0036906009     PISSN: 01422421     EISSN: None     Source Type: Journal    
DOI: 10.1002/sia.1478     Document Type: Article

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