Influence of the depth calibration procedure on the apparent shift of impurity depth profiles measured under conditions of long-term changes in erosion rate

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 18, Issue 1, 2000, Pages 1-6

  Wittmaack, K ^a  

^a INSTITUTE OF EPIDEMIOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL IMPURITIES; ION BOMBARDMENT; MATHEMATICAL MODELS; OXYGEN; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTING SILICON; VACUUM APPLICATIONS;

EROSION ARTIFACTS; IMPURITY DEPTH PROFILES;

NANOSTRUCTURED MATERIALS;

EID: 0033683239     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.591241     Document Type: Article

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