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Volumn 114-116, Issue , 2001, Pages 1139-1143

Effects of elastic-electron scattering on measurements of silicon dioxide film thicknesses by X-ray photoelectron spectroscopy

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON SCATTERING; THICK FILMS; THICKNESS MEASUREMENT; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 17444437794     PISSN: 03682048     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0368-2048(00)00254-1     Document Type: Article
Times cited : (43)

References (14)
  • 10
    • 0342342392 scopus 로고    scopus 로고
    • NIST Electron Elastic-Scattering Cross-Section Database
    • A. Jablonski. Gaithersburg, MD: National Institute of Standards and Technology
    • Jablonski A. NIST Electron Elastic-Scattering Cross-Section Database. Version 2.0. 2000;National Institute of Standards and Technology, Gaithersburg, MD.
    • (2000) Version 2.0
  • 12
    • 0343212058 scopus 로고    scopus 로고
    • C.J. Powell, A. Jablonski (to be published)
    • C.J. Powell, A. Jablonski (to be published).


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.