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Volumn 114-116, Issue , 2001, Pages 1139-1143
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Effects of elastic-electron scattering on measurements of silicon dioxide film thicknesses by X-ray photoelectron spectroscopy
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Author keywords
[No Author keywords available]
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Indexed keywords
ELECTRON SCATTERING;
THICK FILMS;
THICKNESS MEASUREMENT;
X RAY PHOTOELECTRON SPECTROSCOPY;
ELASTIC SCATTERING;
SILICA;
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EID: 17444437794
PISSN: 03682048
EISSN: None
Source Type: Journal
DOI: 10.1016/S0368-2048(00)00254-1 Document Type: Article |
Times cited : (43)
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References (14)
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