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N. V. Nguyen and C. A. Richter, in Silicon Nitride and Silicon Dioxide Thin Insulating Films IV, edited by M. J. Deen et al., PV 97-10 (The Electrochemical Society, NJ, 1997), pp. 183-193.
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J. A. Dura and C. F. Majkrzak, in Semiconductor Characterization: Present Status and Future Needs, edited by W. M. Bullis, D. G. Seiler, and A. C. Diebold (AIP Press, Woodbury, NY, 1996), pp. 549-554.
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6
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For a theory of reflectivity data and modeling, see Pergamon, Elmsford, NY and Ref. 6
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For a theory of reflectivity data and modeling, see M. Born and E. Wolf, Principles of Optics, 6th ed. (Pergamon, Elmsford, NY, 1980), and Ref. 6.
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Principles of Optics, 6th Ed.
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0000521145
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There are other methods for fitting reflectivity data, such as a model independent fitting, which is also nonunique
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There are other methods for fitting reflectivity data, such as a model independent fitting, which is also nonunique, N. F. Berk and C. F. Majkrzak, Phys. Rev. B 51, 11296 (1995).
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10
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0032090048
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A relatively new technique for direct data inversion which requires reference layers exists, which is modeled independently and provides unique results, see
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A relatively new technique for direct data inversion which requires reference layers exists, which is modeled independently and provides unique results, see C. F. Majkrzak, N. F. Berk, J. A. Dura, S. K. Satija, A. Karim, J. Pedulla, and R. D. Deslattes, Physica B 248, 338 (1998).
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Deslattes, R.D.7
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N. V. Nguyen, D. Chandler-Horowitz, J. G. Pellegrino, and P. M. Amirtharaj, in Semiconductor Characterization: Present Status and Future Needs, edited by W. M. Bullis, D. G. Seiler, and A. C. Diebold (AIP Press, Woodbury, NY, 1996), pp. 438-442.
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