Chemical sputtering of carbon by combined exposure to nitrogen ions and atomic hydrogen

New Journal of Physics

Volumn 10, Issue , 2008, Pages

  Schluter M ^a   Hopf, C ^a   Jacob, W ^a  

^a MAX PLANCK INSTITUT FÜR PLASMAPHYSIK   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS CARBON; AMORPHOUS FILMS; ATOMIC PHYSICS; ATOMS; CARBON FILMS; ELECTROLYSIS; HYDROGEN; ION SOURCES; MOLECULES; NITROGEN; SPUTTERING;

AMORPHOUS HYDROGENATED CARBON (A C:H) FILMS; ATOMIC HYDROGEN; CHEMICAL SPUTTERING; COMBINED EXPOSURE; ENERGY DEPENDENCE; EROSION YIELDS; ION ENERGIES; MOLECULAR IONS; NITROGEN IONS; PHYSICAL SPUTTERING; SUBSTRATE TEMPERATURE (ST);

IONS;

EID: 46749123124     PISSN: 13672630     EISSN: None     Source Type: Journal    
DOI: 10.1088/1367-2630/10/5/053037     Document Type: Article

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