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Volumn 290-291, Issue , 1996, Pages 107-111

Ion beam deposited carbon nitride films: Characterization and identification of chemical sputtering

Author keywords

Carbon nitride; Chemical sputtering; Nanoindentation; X ray photoelectron spectroscopy

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CARBON INORGANIC COMPOUNDS; CHEMICAL BONDS; ELECTRON ENERGY LEVELS; FILM GROWTH; FOURIER TRANSFORM INFRARED SPECTROSCOPY; GRAPHITE; HARDNESS; ION BEAMS; ION BOMBARDMENT; NITROGEN; SPUTTER DEPOSITION;

EID: 0030415484     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)09061-X     Document Type: Article
Times cited : (99)

References (16)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.