|
Volumn 290-291, Issue , 1996, Pages 107-111
|
Ion beam deposited carbon nitride films: Characterization and identification of chemical sputtering
|
Author keywords
Carbon nitride; Chemical sputtering; Nanoindentation; X ray photoelectron spectroscopy
|
Indexed keywords
AUGER ELECTRON SPECTROSCOPY;
CARBON INORGANIC COMPOUNDS;
CHEMICAL BONDS;
ELECTRON ENERGY LEVELS;
FILM GROWTH;
FOURIER TRANSFORM INFRARED SPECTROSCOPY;
GRAPHITE;
HARDNESS;
ION BEAMS;
ION BOMBARDMENT;
NITROGEN;
SPUTTER DEPOSITION;
CARBON NITRIDE;
GAS ANALYZER;
NANOINDENTATION;
THIN FILMS;
|
EID: 0030415484
PISSN: 00406090
EISSN: None
Source Type: Journal
DOI: 10.1016/S0040-6090(96)09061-X Document Type: Article |
Times cited : (99)
|
References (16)
|