Temperature dependence of the chemical sputtering of amorphous hydrogenated carbon films by hydrogen

Journal of Nuclear Materials

Volumn 376, Issue 1, 2008, Pages 33-37

  Schluter M ^a   Hopf, C ^a   Schwarz Selinger, T ^a   Jacob, W ^a  

^a MAX PLANCK INSTITUT FÜR PLASMAPHYSIK   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; EROSION; HYDROGEN; HYDROGENATION; SPUTTERING; THERMAL EFFECTS;

CHEMICAL EROSION; EROSION RATES; TEMPERATURE DEPENDENCE;

CARBON FILMS;

EID: 43049151723     PISSN: 00223115     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnucmat.2008.02.002     Document Type: Article

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