SCOPUS 정보 검색 플랫폼

Thin Solid Films

Volumn 308-309, Issue 1-4, 1997, Pages 118-125

Low-energy ion bombardment effects in reactive rf magnetron sputtering of carbon nitride films

(3) Kaltofen, R a Sebald, T a Weise, G a

a IFW DRESDEN (Germany)

Author keywords

Carbon nitride sputtering; Ion bombardment; Magnetron sputtering

Indexed keywords

CHEMICAL BONDS; COMPOSITION EFFECTS; DESORPTION; ELASTIC MODULI; FILM GROWTH; FILM PREPARATION; HELIUM; ION BOMBARDMENT; MAGNETIC FIELD EFFECTS; MAGNETRON SPUTTERING; MASS SPECTROMETRY; NITROGEN;

CARBON NITRIDE FILMS;

AMORPHOUS FILMS;

EID: 0031248743 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(97)00376-3 Document Type: Article

Times cited : (45)

References (46)

1
- 0028377274
- M. Diani, A. Mansour, L. Kubler, J.B. Bischoff and D. Bolmont, Diamond Rel. Mater., 3 (1994) 264.
- (1994) Diamond Rel. Mater. , vol.3 , pp. 264
- Diani, M.¹ Mansour, A.² Kubler, L.³ Bischoff, J.B.⁴ Bolmont, D.⁵

2
- 36449009256
- A. Bousetta, M. Lu, A. Bensaoula and A. Schultz, App. Phys. Lett., 65 (1994) 696.
- (1994) App. Phys. Lett. , vol.65 , pp. 696
- Bousetta, A.¹ Lu, M.² Bensaoula, A.³ Schultz, A.⁴

3
- 21844509437
- A. Bousetta, M. Lu and A. Bensaoula, J. Vac. Sci. Technol., A13 (1995) 1639.
- (1995) J. Vac. Sci. Technol. , vol.A13 , pp. 1639
- Bousetta, A.¹ Lu, M.² Bensaoula, A.³

4
- 0040262800
- B.C. Holloway, D.K. Shuh, M.A. Kelley, W. Tong, J.A. Carlisle, I. Jimenez, D.G.J. Sutherland, L.J. Terminello, P. Pianetta and S. Hagstrom, Thin Solid Films, 290-291 (1996) 94.
- (1996) Thin Solid Films , vol.290-291 , pp. 94
- Holloway, B.C.¹ Shuh, D.K.² Kelley, M.A.³ Tong, W.⁴ Carlisle, J.A.⁵ Jimenez, I.⁶ Sutherland, D.G.J.⁷ Terminello, L.J.⁸ Pianetta, P.⁹ Hagstrom, S.¹⁰

5
- 0038183013
- H. Grüger, D. Selbmann, E. Wolf, A. Leonhard and B. Arnold, Surf. Coatings Technol., 86-87 (1996) 409.
- (1996) Surf. Coatings Technol. , vol.86-87 , pp. 409
- Grüger, H.¹ Selbmann, D.² Wolf, E.³ Leonhard, A.⁴ Arnold, B.⁵

6
- 0028428505
- J. Schwan, W. Dworschak, K. Jung and H. Khrhardt, Diamond Rel. Mater., 3 (1994) 1034.
- (1994) Diamond Rel. Mater. , vol.3 , pp. 1034
- Schwan, J.¹ Dworschak, W.² Jung, K.³ Khrhardt, H.⁴

7
- 21844481998
- S. Veprek, J. Weidemann and F. Glatz, J. Vac. Sci. Technol., A13 (1995) 2914.
- (1995) J. Vac. Sci. Technol. , vol.A13 , pp. 2914
- Veprek, S.¹ Weidemann, J.² Glatz, F.³

8
- 0347418339
- Y. Zhang, Z. Zhou and H. Li, Appl. Phys. Lett., 68 (1996) 34.
- (1996) Appl. Phys. Lett. , vol.68 , pp. 34
- Zhang, Y.¹ Zhou, Z.² Li, H.³

9
- 0346787959
- Y. Chen, E.G. Wang, F. Chen and L. Guo, Mod. Phys. Lett. B, 10 (1996) 537.
- (1996) Mod. Phys. Lett. B , vol.10 , pp. 537
- Chen, Y.¹ Wang, E.G.² Chen, F.³ Guo, L.⁴

10
- 0001206928
- Y. Chen, L. Guo and E.G. Wang, Mod. Phys. Lett. B, 10 (1996) 615.
- (1996) Mod. Phys. Lett. B , vol.10 , pp. 615
- Chen, Y.¹ Guo, L.² Wang, E.G.³

11
- 0028380948
- J. Seth, R. Padiyath and S.V. Baba, Diamond Rel. Mater., 3 (1994) 210.
- (1994) Diamond Rel. Mater. , vol.3 , pp. 210
- Seth, J.¹ Padiyath, R.² Baba, S.V.³

12
- 0010029489
- M. Tabbal, P. Merel, S. Moisa, M. Chaker, A. Ricard and M. Moisan, Appl. Phys. Lett., 69 (1996) 698.
- (1996) Appl. Phys. Lett. , vol.69 , pp. 698
- Tabbal, M.¹ Merel, P.² Moisa, S.³ Chaker, M.⁴ Ricard, A.⁵ Moisan, M.⁶

13
- 0029306991
- M.G. Krishna, K.R. Gunasekhar and S.J. Mohar, Mater. Res., 10 (1995) 1083.
- (1995) Mater. Res. , vol.10 , pp. 1083
- Krishna, M.G.¹ Gunasekhar, K.R.² Mohar, S.J.³

14
- 84881192995
- M.Y. Chen, D. Li, X. Lin, V.P. Dravid, Y.W. Chung, M.S. Wong and W.D. Sproul, J. Vac. Sci. Technol., A11 (1993) 521.
- (1993) J. Vac. Sci. Technol. , vol.A11 , pp. 521
- Chen, M.Y.¹ Li, D.² Lin, X.³ Dravid, V.P.⁴ Chung, Y.W.⁵ Wong, M.S.⁶ Sproul, W.D.⁷

15
- 21544441689
- D. Li, Y.W. Chung, M.S. Wong and W.D. Sproul, J. Appl. Phys., 74 (1993) 219.
- (1993) J. Appl. Phys. , vol.74 , pp. 219
- Li, D.¹ Chung, Y.W.² Wong, M.S.³ Sproul, W.D.⁴

16
- 21344491621
- D. Li, Y.W. Chung, S. Yang, M.S. Wong, F. Adibi and W.D. Sproul, J. Vac. Sci. Technol., A12 (1994) 1470.
- (1994) J. Vac. Sci. Technol. , vol.A12 , pp. 1470
- Li, D.¹ Chung, Y.W.² Yang, S.³ Wong, M.S.⁴ Adibi, F.⁵ Sproul, W.D.⁶

17
- 0028729965
- D. Li, E. Cutiongco, Y.W. Chung, M.S. Wong and W.D. Sproul, Surf. Coatings Technol., 68-69 (1994) 611.
- (1994) Surf. Coatings Technol. , vol.68-69 , pp. 611
- Li, D.¹ Cutiongco, E.² Chung, Y.W.³ Wong, M.S.⁴ Sproul, W.D.⁵

18
- 21544470983
- D. Li, X. Chu, S.C. Cheng, X.W. Li, V.P. Dravid, Y.W. Chung, M.S. Wong and W.D. Sproul, Appl. Phys. Lett., 67 (1995) 203.
- (1995) Appl. Phys. Lett. , vol.67 , pp. 203
- Li, D.¹ Chu, X.² Cheng, S.C.³ Li, X.W.⁴ Dravid, V.P.⁵ Chung, Y.W.⁶ Wong, M.S.⁷ Sproul, W.D.⁸

19
- 21844484392
- D. Li, S. Lopez, Y.W. Chung, M.S. Wong and W.D. Sproul, J. Vac. Sci. Technol., A13 (1995) 1063.
- (1995) J. Vac. Sci. Technol. , vol.A13 , pp. 1063
- Li, D.¹ Lopez, S.² Chung, Y.W.³ Wong, M.S.⁴ Sproul, W.D.⁵

20
- 65949119118
- S. Lopez, M.S. Wong and W.D. Sproul, J. Vac. Sci. Technol., A13 (1995) 1644.
- (1995) J. Vac. Sci. Technol. , vol.A13 , pp. 1644
- Lopez, S.¹ Wong, M.S.² Sproul, W.D.³

21
- 5744252400
- D. Li, X.W. Lin, S.C. Cheng, V.P. Dravid, Y.W. Chung, M.S. Wong and W.D. Sproul, Appl. Phys. Lett., 68 (1996) 1211.
- (1996) Appl. Phys. Lett. , vol.68 , pp. 1211
- Li, D.¹ Lin, X.W.² Cheng, S.C.³ Dravid, V.P.⁴ Chung, Y.W.⁵ Wong, M.S.⁶ Sproul, W.D.⁷

22
- 0028445814
- H. Sjöström, I. Ivanov, M. Johansson, L. Hultman, J.E. Sundgren, S.V. Hainsworth, I.F. Page and L.R. Wallenberg, Thin Solid Films, 246 (1994) 103.
- (1994) Thin Solid Films , vol.246 , pp. 103
- Sjöström, H.¹ Ivanov, I.² Johansson, M.³ Hultman, L.⁴ Sundgren, J.E.⁵ Hainsworth, S.V.⁶ Page, I.F.⁷ Wallenberg, L.R.⁸

23
- 33846441119
- H. Sjöström, S. Stafstrom, M. Boman and J.E. Sundgren, Phys. Rev. Lett., 76 (1996) 2205.
- (1996) Phys. Rev. Lett. , vol.76 , pp. 2205
- Sjöström, H.¹ Stafstrom, S.² Boman, M.³ Sundgren, J.E.⁴

24
- 0030538517
- H. Sjöström, L. Hultman, J.E. Sundgren, S.V. Hainsworth, T.F. Page and G.S.A.M. Theunissen, J. Vac. Sci. Technol., A14 (1996) 56.
- (1996) J. Vac. Sci. Technol. , vol.A14 , pp. 56
- Sjöström, H.¹ Hultman, L.² Sundgren, J.E.³ Hainsworth, S.V.⁴ Page, T.F.⁵ Theunissen, G.S.A.M.⁶

25
- 24544461001
- K.M. Yu, M.L. Coken, E.E. Haller, W.L. Hansen, A.Y. Liu and I.C. Wu, Phys. Rev., B49 (1994) 5034.
- (1994) Phys. Rev. , vol.B49 , pp. 5034
- Yu, K.M.¹ Coken, M.L.² Haller, E.E.³ Hansen, W.L.⁴ Liu, A.Y.⁵ Wu, I.C.⁶

26
- 36449005908
- S. Kumar and T.L. Tansley, J. Appl. Phys., 76 (1994) 4390.
- (1994) J. Appl. Phys. , vol.76 , pp. 4390
- Kumar, S.¹ Tansley, T.L.²

27
- 0347418337
- S. Kumar and T.L. Tansley, Thin Solid Films, 256 (1995) 4428.
- (1995) Thin Solid Films , vol.256 , pp. 4428
- Kumar, S.¹ Tansley, T.L.²

28
- 0040955708
- S. Kumar, T.L. Tansley and L.S. Wielunski, J. Phys. D: Appl. Phys., 28 (1995) 2335.
- (1995) J. Phys. D: Appl. Phys. , vol.28 , pp. 2335
- Kumar, S.¹ Tansley, T.L.² Wielunski, L.S.³

29
- 0000164826
- F. Demichelis, X.F. Rong, S. Schreiter, A. Tagliaferro and C. De Martino, Diamond Rel. Mater., 4 (1995) 361.
- (1995) Diamond Rel. Mater. , vol.4 , pp. 361
- Demichelis, F.¹ Rong, X.F.² Schreiter, S.³ Tagliaferro, A.⁴ De Martino, C.⁵

30
- 1542595244
- Y.A. Li, Z.B. Zhang, S.S. Xie and G.Z. Yang, Chem. Phys. Lett., 247 (1995) 253.
- (1995) Chem. Phys. Lett. , vol.247 , pp. 253
- Li, Y.A.¹ Zhang, Z.B.² Xie, S.S.³ Yang, G.Z.⁴

31
- 0041367919
- Z.B. Zhang, Y.A. Li, S.S. Xie and G.Z. Yang, Chin. Phys. Lett., 13 (1996) 69.
- (1996) Chin. Phys. Lett. , vol.13 , pp. 69
- Zhang, Z.B.¹ Li, Y.A.² Xie, S.S.³ Yang, G.Z.⁴

32
- 0000070523
- T. Okada, S. Yamada, Y. Takeuchi and T. Wada, J. Appl. Phys., 78 (1995) 7416.
- (1995) J. Appl. Phys. , vol.78 , pp. 7416
- Okada, T.¹ Yamada, S.² Takeuchi, Y.³ Wada, T.⁴

33
- 0004805602
- N. Axen, G.A. Botton, R.E. Somekh and I.M. Hutchings, Diamond Rel. Mater., 5 (1996) 163.
- (1996) Diamond Rel. Mater. , vol.5 , pp. 163
- Axen, N.¹ Botton, G.A.² Somekh, R.E.³ Hutchings, I.M.⁴

34
- 0030415483
- R. Kaltofen, T. Sebald and G. Weise, Thin Solid Films, 290-291 (1996) 112.
- (1996) Thin Solid Films , vol.290-291 , pp. 112
- Kaltofen, R.¹ Sebald, T.² Weise, G.³

35
- 0346157436
- in press
- T. Sebald, R. Kaltofen and G. Weise, Surf. Coatings Technol., in press.
- Surf. Coatings Technol.
- Sebald, T.¹ Kaltofen, R.² Weise, G.³

36
- 0026929747
- D. Schneider, Th. Schwarz and B. Schultrich, Thin Solid Films, 219 (1992) 92.
- (1992) Thin Solid Films , vol.219 , pp. 92
- Schneider, D.¹ Schwarz, Th.² Schultrich, B.³

37
- 84907009269
- K.J. Boyd, D. Marton, S.S. Todorov, A.H. Al-Bayati, J. Kulik, R.A. Zuhr and J.W. Rabalais, J. Vac. Sci. Technol., A13 (1995) 2110.
- (1995) J. Vac. Sci. Technol. , vol.A13 , pp. 2110
- Boyd, K.J.¹ Marton, D.² Todorov, S.S.³ Al-Bayati, A.H.⁴ Kulik, J.⁵ Zuhr, R.A.⁶ Rabalais, J.W.⁷

38
- 0030415484
- P. Hammer, M.A. Baker, C. Lenardi and W. Gissler, Thin Solid Films, 290-291 (1996) 107.
- (1996) Thin Solid Films , vol.290-291 , pp. 107
- Hammer, P.¹ Baker, M.A.² Lenardi, C.³ Gissler, W.⁴

39
- 84984352320
- G. Sobe, H. Schreiber, G. Weise and A. Heinrich, Contr. Plasma Phys., 33 (1993) 325.
- (1993) Contr. Plasma Phys. , vol.33 , pp. 325
- Sobe, G.¹ Schreiber, H.² Weise, G.³ Heinrich, A.⁴

40
- 0344893750
- M.M. Shahin, J. Chem. Phys., 47 (1967) 3492.
- (1967) J. Chem. Phys. , vol.47 , pp. 3492
- Shahin, M.M.¹

41
- 0001281825
- F. Howorka, W. Lindinger and R.N. Varney, J. Chem. Phys., 61 (1974) 1180.
- (1974) J. Chem. Phys. , vol.61 , pp. 1180
- Howorka, F.¹ Lindinger, W.² Varney, R.N.³

42
- 0346157436
- submitted
- R. Kaltofen, T. Sebald and G. Weise, Surf. Coatings Technol., submitted.
- Surf. Coatings Technol.
- Kaltofen, R.¹ Sebald, T.² Weise, G.³

43
- 0001548543
- J.H. Kaufmann, S. Metin and D.D. Saperstein, Phys. Rev. B, 39 (1989) 13053.
- (1989) Phys. Rev. B , vol.39 , pp. 13053
- Kaufmann, J.H.¹ Metin, S.² Saperstein, D.D.³

44
- 0027555170
- M. Ricci, M. Trinquecoste, F. Auguste, R. Canet, P. Delhaes, C. Guimon, G. Pfister-Guillouzo, B. Nysten and J.P. Issi, J. Mater. Res., 8 (1993) 480.
- (1993) J. Mater. Res. , vol.8 , pp. 480
- Ricci, M.¹ Trinquecoste, M.² Auguste, F.³ Canet, R.⁴ Delhaes, P.⁵ Guimon, C.⁶ Pfister-Guillouzo, G.⁷ Nysten, B.⁸ Issi, J.P.⁹

45
- 0031212446
- M.A. Baker and P. Hammer, Surface and Interface Analysis, 25 (1997) 629.
- (1997) Surface and Interface Analysis , vol.25 , pp. 629
- Baker, M.A.¹ Hammer, P.²

46
- 0012776240
- D. Drescher, H.-J. Scheibe, A. Mensch, P. Alers and C. Dyer, Diamond Rel. Mater., 5 (1996) 968.
- (1996) Diamond Rel. Mater. , vol.5 , pp. 968
- Drescher, D.¹ Scheibe, H.-J.² Mensch, A.³ Alers, P.⁴ Dyer, C.⁵

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.