Chemical sputtering of a-C:H films by simultaneous exposure to energetic Ar+ ions and water vapor

Journal of Physics: Conference Series

Volumn 100, Issue PART 6, 2008, Pages

  Hopf, C ^a   Schluter M ^a   Jacob, W ^a  

^a MAX PLANCK INSTITUT FÜR PLASMAPHYSIK   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; EROSION; MOLECULES; WATER VAPOR; NANOSCIENCE;

A-C:H FILMS; ADSORBED WATER; AMORPHOUS HYDROCARBONS; CHEMICAL SPUTTERING; EROSION PRODUCTS; EROSION RATES; EXPOSED TO; FILM SURFACES;

ION BOMBARDMENT;

EID: 46749140273     PISSN: 17426588     EISSN: 17426596     Source Type: Conference Proceeding    
DOI: 10.1088/1742-6596/100/6/062012     Document Type: Conference Paper

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