Plasma diagnostic studies to the carbon nitride film deposition by reactive r.f. Magnetron sputtering

Thin Solid Films

Volumn 290-291, Issue , 1996, Pages 112-119

  Kaltofen, R ^a   Sebald, T ^a   Weise, G ^a  

^a IFW DRESDEN   (Germany)

Author keywords

Carbon nitride; Plasma processing and deposition; Sputtering

Indexed keywords

CARBON INORGANIC COMPOUNDS; CHEMICAL BONDS; DESORPTION; ELECTRON ENERGY LEVELS; FILM GROWTH; ION BOMBARDMENT; MAGNETRON SPUTTERING; MASS SPECTROMETRY; PLASMA DIAGNOSTICS; RESIDUAL STRESSES; SPUTTER DEPOSITION;

CARBON NITRIDE; ENERGY RESOLVED MASS SPECTROMETRY; POWER DENSITY;

THIN FILMS;

EID: 0030415483     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(96)09199-7     Document Type: Article

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