Effect of chemical sputtering on the growth and structural evolution of magnetron sputtered CNx thin films

Thin Solid Films

Volumn 382, Issue 1-2, 2001, Pages 146-152

  Hellgren, Niklas ^a,b   Johansson, Mats P ^a,c   Broitman, Esteban ^a   Sandström, Per ^a,d   Hultman, Lars ^a   Sundgren, Jan Eric ^a,d  

^a LINKÖPING UNIVERSITY   (Sweden)

^b University of Illinois at Urbana Champaign   (United States)

^c Thin Film Electronics AB   (Sweden)

^d CHALMERS UNIVERSITY OF TECHNOLOGY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; DESORPTION; MAGNETRON SPUTTERING; MICROSTRUCTURE; MORPHOLOGY; NITROGEN; POROUS MATERIALS; SPUTTER DEPOSITION; SURFACE ROUGHNESS; THERMAL EFFECTS; THIN FILMS;

CARBON NITRIDE; CHEMICAL SPUTTERING;

AMORPHOUS FILMS;

EID: 0034833149     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(00)01690-4     Document Type: Article

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