Growth, structure, and mechanical properties of CNxHy films deposited by dc magnetron sputtering in N2/Ar/H2 discharges

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 5, 2000, Pages 2349-2358

  Hellgren, Niklas ^a   Johansson, Mats P ^a,c   Hjörvarsson, Björgvin ^b   Broitman, Esteban ^a   Östblom, Mattias ^a   Liedberg, Bo ^a   Hultman, Lars ^a   Sundgren, Jan Eric ^a,d  

^a LINKÖPING UNIVERSITY   (Sweden)

^b ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

^c Thin Film Electronics AB   (Sweden)

^d CHALMERS UNIVERSITY OF TECHNOLOGY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

AMMONIA; CRYSTAL STRUCTURE; DESORPTION; ELASTICITY; FILM GROWTH; HARDNESS; HYDROGEN BONDS; MAGNETRON SPUTTERING; NITRIDES; PARTIAL PRESSURE; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SPUTTER DEPOSITION;

DIRECT CURRENT MAGNETRON SPUTTERING; FULL WIDTH AT HALF MAXIMUM (FWHM);

AMORPHOUS FILMS;

EID: 0034276292     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1286395     Document Type: Article

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