Chemical sputtering of carbon films by simultaneous irradiation with argon ions and molecular oxygen

New Journal of Physics

Volumn 10, Issue , 2008, Pages

  Hopf, C ^a   Schluter M ^a   Schwarz Selinger, T ^a   Von Toussaint, U ^a   Jacob, W ^a  

^a MAX PLANCK INSTITUT FÜR PLASMAPHYSIK   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS CARBON; AMORPHOUS FILMS; ARGON; CARBON FILMS; ELECTROLYSIS; EROSION; HYDROCARBONS; INERT GASES; ION BOMBARDMENT; IONS; ORGANIC COMPOUNDS; OXYGEN; SOIL MECHANICS;

ARGON IONS; CHEMICAL SPUTTERING; HYDROCARBON FILMS; ION ENERGIES; ION FLUX DENSITY; OXYGEN FLUX DENSITY; SIMULTANEOUS IRRADIATION; SURFACE TEMPERATURES;

MOLECULAR OXYGEN;

EID: 46749105954     PISSN: 13672630     EISSN: None     Source Type: Journal    
DOI: 10.1088/1367-2630/10/9/093022     Document Type: Article

References (68)

1. Hartney M A, Hess D W and Soane D S 1989 Oxygen plasma etching for resist stripping and multilayer lithography J. Vac. Sci. Technol. B 7 1
2. Massi M, Mansano R D, Maciel H S, Otani C, Verdonck P and Nishioka LNBM 1999 Effects of plasma etching on DLC films Thin Solid Films 343-344 381
3. Urruchi W I, Massi M, Maciel H S, Otani C and Nishioka L N 2000 Etching of DLC films using a low intensity oxygen plasma jet Diamond Relat. Mater. 9 685
4. Steudel S, Myny K, De Vusser S, Genoe J and Heremans P 2006 Patterning of organic thin film transistors by oxygen plasma etch Appl. Phys. Lett. 89 183503
5. Liu C-C, Nealey P F, Ting Y-H and Wendt A E 2007 Pattern transfer using poly(styrene-block-methyl methacrylate) copolymer films and reactive ion etching J. Vac. Sci. Technol. B 25 1963
6. Meng E, Li P-Y and Tai Y-C 2008 Plasma removal of parylene C J. Micromech. Microeng. 18 045004
7. Hirakuri K K, Kuwashima K, Tatsuta K and Sato K 2005 Etching of diamond-like carbon films deposited on polyethylene terephtalate Diamond Relat. Mater. 14 1067
8. Eggenstein F, Senf F, Zeschke T and Gudat W 2001 Cleaning of contaminated XUV-optics at BESSY II Nucl. Instrum. Methods A 467 325
9. Rossi F, Kylián O and Hasiwa M 2006 Decontamination of surfaces by low pressure plasma discharges Plasma Process. Polym. 3 431
10. Moisan M, Berbeau J, Crevier M-C, Pelletier J, Philip N and Saoudi B 2002 Plasma sterilization. Methods and mechanisms Pure Appl. Chem. 74 349
11. Lerouge S, Wertheimer M R and Yahia L'H 2001 Plasma sterilization: a review of parameters, mechanisms, and limitations Plasmas Polym. 6 175
12. Raballand V, Benedikt J, Wunderlich J and von Keudell A 2008 Inactivation of Bacillus atrophaeus and of Aspergillus niger using beams of argon ions, of oxygen molecules and of oxygen atoms J. Phys. D: Appl. Phys. 41 115207
13. Federici G et al 2001 Plasma-material interactions in current tokamaks and their implications for next step fusion devices Nucl. Fusion 41 1967
14. Jacob W 2005 Redeposition of hydrocarbon layers in fusion devices J. Nucl. Mater. 337-339 839
15. von Keudell A, Hopf C, Schwarz-Selinger T and Jacob W 1999 Surface loss probabilities of hydrocarbon radicals on amorphous hydrogenated carbon film surfaces: consequences for the formation of re-deposited layers in fusion experiments Nucl. Fusion 39 1451
16. Counsell G et al 2006 Tritium retention in next step devices and the requirements for mitigation and removal techniques Plasma Phys. Control. Fusion 48 189
17. Hsu W L 1989 Glow discharge removal of codeposited carbon films in graphite-lined tokamak reactors. J. Vac. Sci. Technol. A 7 1047
18. Jacob W, Landkammer B and Wu C H 1999 Removal of codeposited layers by ECR discharge cleaning J. Nucl. Mater. 266-269 552
19. Mueller D, Blanchard W, Collins J, Hosea J, Kamperschroer J, LaMarche P H, Nagy A, Owens D K and Skinner C H 1997 Tritium removal from TFTR J. Nucl. Mater. 241-243 897
20. Moormann R, Alberici S, Hinssen H-K and Wu C H 2000 Examination of codeposited a-C:D layers in oxygen Fusion Eng. Des. 49-50 295
21. Hopf C, Rohde V, Jacob W, Herrmann A, Neu R, Roth J and ASDEX Upgrade Team 2007 Oxygen glow discharge cleaning in ASDEX Upgrade J. Nucl. Mater. 363-365 882
22. Marsh H and Kuo K 1989 Kinetics and catalysis of carbon gasification Introduction to Carbon Science (London: Butterworths) p 107
23. Landkammer B 1999 Untersuchung der Erosion von Kohlenwasserstoffschichten in Sauerstoff-Gasentladungen PhD Thesis Universität Bayreuth
24. Stanmore B R, Brilhac J F and Gilot P 2001 The oxidation of soot: a review of experiments, mechanisms and models Carbon 39 2247
25. Müller J-O, Su D S, Jentoft R E, Kröhnert J, Jentoft F C and Schlögl R 2005 Morphology-controlled reactivity of carbonaceous materials towards oxidation Catal. Today 102 259
26. Balden M, Klages K U, Jacob W and Roth J 2005 Oxidative erosion of graphite in air between 600 and 1000 K7. Nucl. Mater. 341 31
27. Wang W, Jacob W and Roth J 1997 Oxidation and hydrogen isotope exchange in amorphous, deuterated carbon films J. Nucl. Mater. 245 66
28. Rosner D E and Allendorf H D 1970 Proc. Int. Conf. in Metallurgy and Materials Science (Philadelphia, 8-10 September 1969) ed G R Belton and W L Worrell (New York: Plenum) pp 231-51
29. Cataldo F 2007 Ozone reaction with carbon nanostructures 2: the reaction of ozone with milled graphite and different carbon black grades J. Nanosci. Nanotechnol. 7 1446
30. Hechtl E, Bohdansky J and Roth J 1981 The sputtering yield of typical impurity ions for different fusion reactor materials J. Nucl. Mater. 103-104 333
31. Hechtl E and Bohdansky J 1984 Sputtering behavior of graphite and molybdenum at low bombarding energies J. Nucl. Mater. 122-123 1431
32. Refke A, Philipps V, Vietzke E, Erdweg M and von Seggern J 1994 Interaction of energetic oxygen with different boron/carbon materials. J. Nucl. Mater. 212-215 1255
33. Jacob W and Roth J 2007 Chemical sputtering Sputtering by Particle Bombardment IV {Topics in Applied Physics vol 110) ed R Behrisch and W Eckstein (Berlin: Springer) pp 329-400
34. Coburn J W and Winters H F 1979 Ion- and electron-assisted gas-surface chemistry-an important effect in plasma etching J. Appl. Phys. 50 3189
35. Vietzke E, Flaskamp K and Philipps V 1982 Hydrocarbon formation in the reaction of atomic hydrogen with pyrolytic graphite and the synergistic effect of argon ion bombardments Nucl Mater. 111-112 763 8
36. + ion and H atom impact Nucl. Fusion 42 L27
37. Hopf C, von Keudell A and Jacob W 2003 Chemical sputtering of hydrocarbon films J. Appl. Phys. 94 2373
38. Landkammer B, von Keudell A and Jacob W 1999 Erosion of thin hydrogenated carbon films in oxygen, oxygen/hydrogen and water plasmas J. Nucl. Mater. 264 48
39. Baggerman J A G, Visser R J and Collart J H 1994 Ion-induced etching of organic polymers in argon and oxygen radio-frequency plasmas J. Appl. Phys. 75 758
40. Gokan H and Esho S 1984 Sputtering yield of carbon atoms in organic materials for oxygen bombardment. J. Electrochem. Soc. 131 1105
41. Murillo R, Poncin-Epaillard F and Segui Y 2007 Plasma etching of organic material: combined effects of charged and neutral species Eur. Phys. J. Appl. Phys. 37 299
42. Hopf C, Jacob W and Rohde V 2008 Oxygen glow discharge cleaning in nuclear fusion devices J. Nucl. Mater. 374 413
43. Ferreira J A, Tabarés F L and Tafalla D 2007 Removal of carbon deposits in narrow gaps by oxygen plasmas at low pressure J. Vac. Sci. Technol. A 25 746
44. Schwarz-Selinger T, Genoese F, Hopf C and Jacob W 2008 Carbon removal from tile-gap structures with oxygen glow discharges J. Nucl. Mater. at press
45. Collart E J H, Baggerman J A G and Visser R J 1995 On the role of atomic oxygen in the etching of organic polymers in a radio-frequency oxygen discharge J. Appl. Phys. 78 47
46. + on graphite and the use of graphite for oxygen collector probes J. Nucl. Mater. 145-147 425
47. Hopf C, Schlüter M and Jacob W 2007 Chemical sputtering of carbon films by argon ions and molecular oxygen at cryogenic temperatures Appl. Phys. Lett. 90 224106
48. Maya P N, von Toussaint U and Hopf C 2008 Synergistic erosion process of hydrocarbon films: a molecular dynamics study New J. Phys. 10 023002
49. Jacob W, Hopf C, von Keudell A, Meier M and Schwarz-Selinger T 2003 Particle-beam experiment to study heterogeneous surface reactions relevant to plasma-assisted thin film growth and etching Rev. Sci. Instrum. 74 5123
50. Schwarz-Selinger T, von Keudell A and Jacob W 1999 Plasma chemical vapor deposition of hydrocarbon films: the influence of hydrocarbon source gas on the film properties J. Appl. Phys. 86 3988
51. + ions and water vapor J. Phys. : Conf. Series 100 062012
52. Eckstein W 1991 Computer Simulation of Ion-Solid Interactions (Springer Series in Materials Science) 1st edn (Berlin: Springer)
53. Hopf C and Jacob W 2005 Bombardment of graphite with hydrogen isotopes: a model for the energy dependence of the chemical sputtering yield J. Nucl. Mater. 342 141
54. Roth J and García-Rosales C 1996 Analytic description of the chemical erosion of graphite by hydrogen ions Nucl. Fusion 36 1647
55. Roth J and García-Rosales C 1997 Analytic description of the chemical erosion of graphite by hydrogen ions Nucl. Fusion 37 897 (corrigendum)
56. Schlüter M, Hopf C, Schwarz-Selinger T and Jacob W 2008 Temperature dependence of the chemical sputtering of amorphous hydrogenated carbon films by hydrogen J. Nucl. Mater. 376 33
57. Mullins C B and Coburn J W 1994 Ion-beam-assisted etching of Si with fluorine at low temperatures J. Appl. Phys. 76 7562
58. 2 etching: temperature dependence in the range 100-1000 K J. Vac. Sci. Technol. A 14 2820
59. 2 etching: temperature dependence J. Vac. Sci. Technol. A 18 2759
60. 2 etching: temperature dependence J. Vac. Sci. Technol. A 14 2766
61. Joubert O, Pelletier J and Arnal Y 1989 The etching of polymers in oxygen-based plasmas: a parametric study J. Appl Phys. 65 5096
62. Vanderlinde W E and Ruoff A L 1988 Reactive ion beam etching of polyimide thin films J. Vac. Sci. Technol. B6 1621
63. Standaert T E F M, Matsuo P J, Li X, Oehrlein G S, Lu T-M, Gutmann R, Rosenmayer C T, Bartz J W, Langan J G and Entley W R 2001 High-density plasma patterning of low dielectric constant polymers: a comparison between polytetrafluorethylene, parylene-N, and poly(arylene ether) J. Vac. Sci. Technol. A 19 435
64. Hopf C, Jacob W and von Keudell A 2005 Ion-induced surface activation, chemical sputtering, and hydrogen release during plasma-assisted hydrocarbon film growth J. Appl. Phys. 97 094904
65. Haynes B S 2001 A turnover model for carbon reactivity. I. Development Combust. Flame 126 1421
66. Makino A, Namikiri T and Kimura K 2003 Combustion rates of graphite rods in the forward stagnation field with high-temperature airflow Combust. Flame 132 743
67. Gozzi D, Guzzardi G and Salleo A 1996 High temperature reactivity of different forms of carbon at low oxygen fugacity Solid State Ion. 83 177
68. Jacob W, Hopf C and Schlüter M 2006 Chemical sputtering of carbon materials due to combined bombardment by ions and atomic hydrogen Phys. Scr. T 124 32