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Diamond and Related Materials

Volumn 9, Issue 3, 2000, Pages 573-576

In situ deposition and etching process of a-C:H:N films in a dual electron cyclotron resonance-radio frequency plasma

(4) Hong, Junegie a Granier, Agnès a Goullet, Antoine a Turban, Guy a

a INSTITUT DES MATÉRIAUX JEAN ROUXEL (France)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS FILMS; ELECTRON CYCLOTRON RESONANCE; ELLIPSOMETRY; EMISSION SPECTROSCOPY; ETCHING; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROGENATION; METHANE; NITROGEN; OPTICAL PROPERTIES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY;

CARBON NITRIDE;

CARBON INORGANIC COMPOUNDS;

EID: 0033738334 PISSN: 09259635 EISSN: None Source Type: Journal
DOI: 10.1016/S0925-9635(99)00263-0 Document Type: Article

Times cited : (19)

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