Etching process of hydrogenated amorphous carbon (a-C:H) thin films in a dual ECR-r.f. nitrogen plasma

Diamond and Related Materials

Volumn 8, Issue 2-5, 1999, Pages 572-576

  Hong, Junegie ^a   Turban, Guy ^a  

^a INSTITUT DES MATÉRIAUX JEAN ROUXEL   (France)

Author keywords

Amorphous hydrogenated carbon; Dual ECR r.f. plasma; Nitrogenated carbon film; Surface characterization

Indexed keywords

ATOMIC FORCE MICROSCOPY; CARBON; CHEMICAL BONDS; ELLIPSOMETRY; EMISSION SPECTROSCOPY; HYDROGENATION; MASS SPECTROMETERS; NITROGEN; PLASMA ETCHING; SURFACE ROUGHNESS; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

DECONVOLUTION ANALYSIS; OPTICAL EMISSION SPECTROSCOPY;

AMORPHOUS FILMS;

EID: 0032614365     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0925-9635(98)00337-9     Document Type: Article

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