Chemical sputtering of carbon films by argon ions and molecular oxygen at cryogenic temperatures

Applied Physics Letters

Volumn 90, Issue 22, 2007, Pages

  Hopf, C ^a   Schluter M ^a   Jacob, W ^a  

^a MAX PLANCK INSTITUT FÜR PLASMAPHYSIK   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; CRYOGENICS; HYDROGENATION; ION BOMBARDMENT; IONS; MOLECULAR OXYGEN; SPUTTERING;

ARGON IONS; CRYOGENIC TEMPERATURES; EROSION RATES; PHYSICAL SPUTTERING;

CARBON FILMS;

EID: 34249871883     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2745267     Document Type: Article

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