Cryogenic deposition of carbon nitride thin solid films by reactive magnetron sputtering; Suppression of the chemical desorption processes

Thin Solid Films

Volumn 478, Issue 1-2, 2005, Pages 34-41

  Neidhardt, J ^a   Hogberg H ^a   Hultman, L ^a  

^a LINKÖPING UNIVERSITY   (Sweden)

Author keywords

Cryogenic synthesis; Fullerene like carbon nitride; Magnetron sputtering

Indexed keywords

ADSORPTION; DESORPTION; FULLERENES; ION BEAM ASSISTED DEPOSITION; LOW TEMPERATURE PHENOMENA; MAGNETRON SPUTTERING; NANOSTRUCTURED MATERIALS; NITROGEN; PLASMAS; SUBLIMATION; SYNTHESIS (CHEMICAL); THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

CRYOGENIC SYNTHESIS; FULLERENE-LIKE CARBON NITRIDE; GROWTH SURFACES; SUBSTRATE TEMPERATURES;

CARBON NITRIDE;

EID: 14544303206     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.09.055     Document Type: Article

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