Growth and erosion of amorphous carbon (a-C:H) films by low-temperature laboratory plasmas containing H and N mixtures

Journal of Nuclear Materials

Volumn 363-365, Issue 1-3, 2007, Pages 174-178

  Schwarz Selinger, Thomas ^a   Hopf, Christian ^a   Sun, Chao ^a   Jacob, Wolfgang ^a  

^a MAX PLANCK INSTITUT FÜR PLASMAPHYSIK   (Germany)

Author keywords

Amorphous films (a C:D); Chemical erosion (chemical sputtering) co deposition; Deposition (redeposition, erosion, deposition); E0400; Erosion; F0400; Ion surface interaction; P0500; R0900; S1300

Indexed keywords

ELECTRON CYCLOTRON RESONANCE; HYDROGEN; NITROGEN; PLASMA DEPOSITION; PLASMAS;

AMORPHOUS HYDROGENATED CARBON (A-C:H); CHEMICAL SPUTTERING; E0400; F0400; P0500; S1300;

AMORPHOUS CARBON;

EID: 34248597837     PISSN: 00223115     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnucmat.2007.01.005     Document Type: Article

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