Hard and high-temperature-resistant silicon carbonitride coatings based on N-silyl-substituted cyclodisilazane rings

Journal of the Electrochemical Society

Volumn 155, Issue 4, 2008, Pages

  Wrobel, A M ^a   Blaszczyk Lezak, I ^a   Walkiewicz Pietrzykowska, A ^a   Aoki, T ^b   Kulpinski, J ^c  

^a CENTRE OF MOLECULAR AND MACROMOLECULAR STUDIES   (Poland)

^b SHIZUOKA UNIVERSITY   (Japan)

^c LODZ UNIVERSITY OF TECHNOLOGY   (Poland)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL VAPOR DEPOSITION; FILM GROWTH; SILICON COMPOUNDS; SURFACE MORPHOLOGY; SURFACE ROUGHNESS;

FRICTION COEFFICIENT; INFRARED BANDS; STRUCTURAL PARAMETERS;

THIN FILMS;

EID: 40549102832     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.2838067     Document Type: Article

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