Silicon carbonitride by remote microwave plasma CVD from organosilicon precursor: Physical and mechanical properties of deposited Si:C:N films

Applied Surface Science

Volumn 253, Issue 18, 2007, Pages 7404-7411

  Blaszczyk Lezak, I ^a   Wrobel, A M ^a  

^a CENTRE OF MOLECULAR AND MACROMOLECULAR STUDIES   (Poland)

Author keywords

Density; Elastic modulus; Friction coefficient; Hardness; Plasticity index; Slicon carbonitride film

Indexed keywords

CHEMICAL VAPOR DEPOSITION; COATINGS; ELASTIC MODULI; FRICTION; INFRARED ABSORPTION; PLASTICITY; X RAY PHOTOELECTRON SPECTROSCOPY;

DEPOSITION TEMPERATURE; MICROWAVE HYDROGEN PLASMA; PLASMA GENERATION; SURFACE MECHANICS;

SILICON COMPOUNDS;

EID: 34249886328     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2007.03.027     Document Type: Article

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