Optical properties and photoconductivity of amorphous silicon carbon nitride thin film and its application for UV detection

Diamond and Related Materials

Volumn 14, Issue 3-7, 2005, Pages 1010-1013

  Chen, C W ^a   Huang, C C ^a   Lin, Y Y ^a   Chen, L C ^a   Chen, K H ^b   Su, W F ^a  

^a NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^b INSTITUTE OF ATOMIC AND MOLECULAR SCIENCES   (Taiwan)

Author keywords

Amorphous silicon carbon nitride; MSM; Optical band gap; UV detector

Indexed keywords

AMORPHOUS SILICON; CARBON NITRIDE; OPTICAL PROPERTIES; PHOTOCONDUCTIVITY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; THIN FILMS; ULTRAVIOLET DETECTORS; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

AMORPHOUS SILICON CARBON NITRIDE; MSM; OPTICAL BAND GAP; SPECTRAL MICROREFLECTOMETRY;

AMORPHOUS FILMS;

EID: 18444391842     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2004.11.027     Document Type: Conference Paper

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