Thermal plasma chemical vapor deposition of wear-resistant, hard Si-C-N coatings

Surface and Coatings Technology

Volumn 201, Issue 7 SPEC. ISS., 2006, Pages 4168-4173

  Wagner, Nicole J ^a   Gerberich, William W ^a   Heberlein, Joachim V R ^a  

^a UNIVERSITY OF MINNESOTA   (United States)

Author keywords

Silicon carbide; Silicon nitride; Thermal plasma chemical vapor deposition; Wear

Indexed keywords

AMORPHOUS FILMS; CHEMICAL VAPOR DEPOSITION; DISSOCIATION; MECHANICAL PROPERTIES; MORPHOLOGY; PLASMA TORCHES; SILICON CARBIDE; SILICON NITRIDE; SYNTHESIS (CHEMICAL); TEMPERATURE; THERMODYNAMICS; WEAR RESISTANCE;

HARD COATINGS; THERMAL PLASMA CHEMICAL VAPOR DEPOSITION; TORCH PLASMA REACTOR;

INORGANIC COATINGS;

AMORPHOUS FILMS; CHEMICAL VAPOR DEPOSITION; DISSOCIATION; INORGANIC COATINGS; MECHANICAL PROPERTIES; MORPHOLOGY; PLASMA TORCHES; SILICON CARBIDE; SILICON NITRIDE; SYNTHESIS (CHEMICAL); TEMPERATURE; THERMODYNAMICS; WEAR RESISTANCE;

EID: 33751292228     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2006.08.047     Document Type: Article

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