Effect of nitrogen gas flow on amorphous Si-C-N films produced by PVD techniques

Surface and Coatings Technology

Volumn 174-175, Issue , 2003, Pages 324-330

  Moura, C ^a   Cunha, L ^a   Orfao H ^a   Pischow, K ^b   De Rijk, J ^b   Rybinski, M ^a   Mrzyk, D ^a  

^a UNIVERSITY OF MINHO   (Portugal)

^b Savcor Group Ltd Oy   (Finland)

Author keywords

Magnetron sputtering; Nano indentation experiments; Raman spectroscopy; Si C N films; Young's modulus

Indexed keywords

CHEMICAL BONDS; ELASTIC MODULI; MAGNETRON SPUTTERING; MICROSTRUCTURE; PHYSICAL VAPOR DEPOSITION; THIN FILMS;

SILICON TARGETS;

SILICON ALLOYS;

COATING; INDUSTRIAL APPLICATION; PLASMA; SURFACE PROPERTY;

EID: 0042357263     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(03)00686-8     Document Type: Article

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