Microstructure and chemical bonding in silicon carbonitride films synthesized by plasma enhanced chemical vapor deposition

Journal of Structural Chemistry

Volumn 44, Issue 1, 2003, Pages 169-173

  Smirnova, T P ^a   Badalyan, A M ^a   Borisov, V O ^a   Yakovkina, L V ^a   Kaichev, V V ^b   Shmakov, A N ^b   Nartova, A V ^b   Rakhlin, V I ^c   Fomina, A N ^c  

^a NIKOLAEV INSTITUTE OF INORGANIC CHEMISTRY   (Russian Federation)

^b BORESKOV INSTITUTE OF CATALYSIS   (Russian Federation)

^c A E FAVORSKY IRKUTSK INSTITUTE OF CHEMISTRY   (Russian Federation)

Author keywords

Film microstructure; Films; Silicon carbonitride; X ray phase analysis

Indexed keywords

CYANIDE; SILICON CARBONITRIDE; SILICON DERIVATIVE; UNCLASSIFIED DRUG;

ARTICLE; CHEMICAL BOND; CHEMICAL STRUCTURE; CRYSTAL STRUCTURE; FILM; HYDROGEN BOND; STRUCTURE ANALYSIS; SYNTHESIS; VAPOR; X RAY DIFFRACTION;

EID: 0042711034     PISSN: 00224766     EISSN: None     Source Type: Journal    
DOI: 10.1023/A:1024953518950     Document Type: Article

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