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Volumn 26, Issue 8, 2006, Pages 1325-1335

Hard silicon carbonitride films obtained by RF-plasma-enhanced chemical vapour deposition using the single-source precursor bis(trimethylsilyl)carbodiimide

Author keywords

Films; Hardness; PECVD; Si C N; Wear resistance

Indexed keywords

AMORPHOUS SILICON; ATOMIC FORCE MICROSCOPY; CARBON NITRIDE; CORROSION RESISTANCE; ELLIPSOMETRY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HARDNESS; OPTICAL MICROSCOPY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; TRIBOLOGY; WEAR RESISTANCE; X RAY DIFFRACTION;

EID: 32644473022     PISSN: 09552219     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jeurceramsoc.2005.02.004     Document Type: Article
Times cited : (49)

References (59)
  • 31
    • 32644473489 scopus 로고    scopus 로고
    • Dissertation, TU Darmstadt
    • (a) Greiner, A., Dissertation, TU Darmstadt, 1998.
    • (1998)
    • Greiner, A.1
  • 33
    • 0001729645 scopus 로고    scopus 로고
    • (c) Angew. Chem. 106 1997 657
    • (1997) Angew. Chem. , vol.106 , pp. 657
  • 35
    • 32644485225 scopus 로고    scopus 로고
    • Dissertation, University of Karlsruhe [in German]
    • Lutz, H., Dissertation, University of Karlsruhe, 2001 [in German].
    • (2001)
    • Lutz, H.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.