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Volumn 26, Issue 8, 2006, Pages 1325-1335
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Hard silicon carbonitride films obtained by RF-plasma-enhanced chemical vapour deposition using the single-source precursor bis(trimethylsilyl)carbodiimide
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Author keywords
Films; Hardness; PECVD; Si C N; Wear resistance
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Indexed keywords
AMORPHOUS SILICON;
ATOMIC FORCE MICROSCOPY;
CARBON NITRIDE;
CORROSION RESISTANCE;
ELLIPSOMETRY;
FOURIER TRANSFORM INFRARED SPECTROSCOPY;
HARDNESS;
OPTICAL MICROSCOPY;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
TRIBOLOGY;
WEAR RESISTANCE;
X RAY DIFFRACTION;
BIS TRIMETHYLSILYL CARBODIIMIDE (BTSC);
GLOW DISCHARGE OPTICAL EMISSION SPECTROSCOPY (GDOES);
HARD SILICON CARBON NITRIDE FILMS;
PROTECTIVE COATINGS;
AMORPHOUS SILICON;
ATOMIC FORCE MICROSCOPY;
CARBON NITRIDE;
CORROSION RESISTANCE;
ELLIPSOMETRY;
FOURIER TRANSFORM INFRARED SPECTROSCOPY;
HARDNESS;
OPTICAL MICROSCOPY;
PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;
PROTECTIVE COATINGS;
TRIBOLOGY;
WEAR RESISTANCE;
X RAY DIFFRACTION;
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EID: 32644473022
PISSN: 09552219
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jeurceramsoc.2005.02.004 Document Type: Article |
Times cited : (49)
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References (59)
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