Structures and properties of the SiNC films on Si wafer at different deposition stages

Thin Solid Films

Volumn 398-399, Issue , 2001, Pages 413-418

  Wu, J Y ^a   Kuo, C T ^a   Liu, T L ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

Deposition mechanism; MPCVD; Nano indentation; Silicon carbon nitride

Indexed keywords

CATHODOLUMINESCENCE; CHEMICAL VAPOR DEPOSITION; CRYSTAL STRUCTURE; NANOSTRUCTURED MATERIALS; SILICON COMPOUNDS; SILICON WAFERS;

MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION (MPCVD);

THIN FILMS;

EID: 0035507010     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(01)01350-5     Document Type: Conference Paper

References (19)