Field emission of nanostructured amorphous SiCN films deposited by reactive magnetron sputtering of SiC in CH4/N2 atmosphere

Thin Solid Films

Volumn 416, Issue 1-2, 2002, Pages 85-91

  Lin, H Y ^a   Chen, Y C ^b   Lin, C Y ^c   Tong, Y P ^a   Hwa, L G ^b   Chen, K H ^d   Chen, L C ^c  

^a NATIONAL DEFENSE UNIVERSITY   (Taiwan)

^b FU JEN CATHOLIC UNIVERSITY   (Taiwan)

^c NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^d INSTITUTE OF ATOMIC AND MOLECULAR SCIENCES   (Taiwan)

Author keywords

Field emission; Nanostructures; Raman; Reactive magnetron sputtering

Indexed keywords

AMORPHOUS MATERIALS; AUGER ELECTRON SPECTROSCOPY; CHEMICAL BONDS; COMPOSITION; CURRENT DENSITY; ELECTRIC CONDUCTIVITY; MAGNETRON SPUTTERING; METHANE; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SILICON CARBIDE; SPUTTER DEPOSITION; TRANSMISSION ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

GAS MIXTURES;

NANOSTRUCTURED MATERIALS;

EID: 0037009760     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(02)00712-5     Document Type: Article

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