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Diamond and Related Materials

Volumn 6, Issue 9, 1997, Pages 1081-1091

Atomic hydrogen-induced chemical vapor deposition of a-Si:C:H thin-film materials from alkylsilane precursors

(6) Wrobel A M a Wickramanayaka, S b,d Nakanishi, Y b Hatanaka, Y b Pawlowski S c Olejniczak, W c

a CENTRE OF MOLECULAR AND MACROMOLECULAR STUDIES (Poland)

b SHIZUOKA UNIVERSITY (Japan)

c UNIVERSITY OF LODZ (Poland)

d Canon ANELVA Technix Corporation (Japan)

Author keywords

Atomic hydrogena; CVD; Optoelectronic properties; Plasma

Indexed keywords

EID: 0038025075 PISSN: 09259635 EISSN: None Source Type: Journal
DOI: 10.1016/s0925-9635(97)00023-x Document Type: Article

Times cited : (25)

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